Abstract: A method for the purification of a semiconductor material, the method comprising the steps of: a) the oxidation at an anode, which is placed in an anodic electrolyte, of a solid semiconductor material to be purified by application of one or more ionic compounds; b) the reduction at a cathode, which is placed in a cathodic electrolyte, of one or more compounds obtained in step a), to a purified, solid semiconductor material where one or more ionic compounds are also formed; where the one or more ionic compounds that are formed in step b) are applied in step a) and the anode and cathode are mutually connected for electron transfer. The formed ionic compounds are purified externally. The present method can for example be applied for the purification of silicon.