Abstract: A support ring for supporting a semiconductor wafer in a boat of a vertical furnace used in processing of the semiconductor wafer includes a semicircular segment. The semicircular segment has an upper surface, a lower surface opposite the upper surface, a radial inner wall defining an inner radius, and a radial outer wall defining an outer radius. The support ring further includes protrusions in the upper surface of the semicircular segment. The protrusions extend above the upper surface.
Type:
Grant
Filed:
June 1, 2018
Date of Patent:
October 29, 2019
Assignee:
GlobalWafters Co., Ltd.
Inventors:
Qingmin Liu, William Lynn Luter, Shawn George Thomas