Abstract: A method for manufacturing a coating material formed on an inner surface of a chamber is provided. The method includes: i) providing a substrate including at least one material selected from the group consisting of SiC, SiO2, and Al2O3; ii) providing a first coating portion including SiOx (0.1?x?2 as a molar ratio) or AlOy (0.1?y?1.5 as a molar ratio) on the substrate; iii) providing a second coating portion including YOz (0.1?z?1.5 as a molar ratio) on the first coating portion; iv) providing a laminate in which the first coating portion and the second coating portion are repeatedly stacked; and v) heating the laminate to provide a coating layer of a single crystalline layer by a solid-state reaction between the first coating portion and the second coating portion.

Abstract: Provided is a method of manufacturing a plasma-resistant multilayer coating film, the method including performing a primary surface treatment on a surface of a base material having a pinhole, in which a base material includes at least one material selected from ceramic, metal, semiconductor, or glass, depositing a preliminary primary coating layer covering the pinhole, on the surface of the base material, performing a secondary surface treatment on the preliminary primary coating layer to form a primary coating layer, and depositing a secondary coating layer on the primary coating layer, in which the secondary surface treatment is an ion beam treatment process, and an upper surface of the primary coating layer is flattened by the secondary surface treatment.