Abstract: Method for producing composite wafers with thin high-quality semiconductor films atomically attached to synthetic diamond wafers is disclosed. Synthetic diamond substrates are created by depositing synthetic diamond onto a nucleating layer deposited on bulk semiconductor wafer which has been prepared to allow separation of the thin semiconductor film from the remaining bulk semiconductor wafer. The remaining semiconductor wafer is available for reuse. The synthetic diamond substrate serves as heat spreader and a mechanical substrate.
Type:
Grant
Filed:
January 22, 2008
Date of Patent:
May 17, 2011
Assignee:
Group4 Labs, LLC
Inventors:
Daniel Francis, Felix Ejeckam, John Wasserbauer, Firooz Faili, Dubravko Babic
Abstract: Methods for integrating wide-gap semiconductors with synthetic diamond substrates are disclosed. Diamond substrates are created by depositing synthetic diamond onto a nucleating layer deposited or formed on a layered structure including at least one layer of gallium nitride, aluminum nitride, silicon carbide, or zinc oxide. The resulting structure is a low stress process compatible with wide-gap semiconductor films, and may be processed into optical or high-power electronic devices. The diamond substrates serve as heat sinks or mechanical substrates.
Type:
Application
Filed:
September 29, 2009
Publication date:
April 29, 2010
Applicant:
Group4 Labs, LLC
Inventors:
Daniel Francis, Felix Ejeckam, John Wasserbauer, Dubravko Babic
Abstract: Methods for integrating wide-gap semiconductors with synthetic diamond substrates are disclosed. Diamond substrates are created by depositing synthetic diamond onto a nucleating layer deposited or formed on a layered structure including at least one layer of gallium nitride, aluminum nitride, silicon carbide, or zinc oxide. The resulting structure is a low stress process compatible with wide-gap semiconductor films, and may be processed into optical or high-power electronic devices. The diamond substrates serve as heat sinks or mechanical substrates.
Type:
Application
Filed:
June 12, 2009
Publication date:
January 7, 2010
Applicant:
Group4 Labs, LLC
Inventors:
Daniel Francis, Felix Ejeckam, John Wasserbauer, Dubravko Babic
Abstract: Methods for integrating wide-gap semiconductors with synthetic diamond substrates are disclosed. Diamond substrates are created by depositing synthetic diamond onto a nucleating layer deposited or formed on a layered structure including at least one layer of gallium nitride, aluminum nitride, silicon carbide, or zinc oxide. The resulting structure is a low stress process compatible with wide-gap semiconductor films, and may be processed into optical or high-power electronic devices. The diamond substrates serve as heat sinks or mechanical substrates.
Type:
Grant
Filed:
April 12, 2006
Date of Patent:
September 29, 2009
Assignee:
Group4 Labs LLC
Inventors:
Daniel Francis, Felix Ejeckam, John Wasserbauer, Dubravko Babic