Abstract: Structural support (1) including a first support portion (2) delimiting at least one containment compartment (4, 4?); a second support portion (6) at least partly in front of the containment compartment (4, 4?); and a sliding element (4), housed in the containment compartment (4, 4?) and interposed between the first (2) and the second (6) support portion. The sliding element (8) substantially consists of a thermo-processable fluoro-polymer with a melt-mass flow rate—according to the ISO 1133-1:2011 standard—of less than 5.0 grams/10 minutes, for example under 3.0 grams/10 minutes.

Abstract: A non-porous composite is provided that includes a textile substrate impregnated with a first fluoropolymer and a film of polymeric material comprising at least one second fluoropolymer filled with porous particles of a silicate having a granulometric dimension d50 less than or equal to 5 ?m and a porosity ranging from 30 to 60% in volume and loaded with antibacterial ions of at least one metal selected from the group consisting of silver, copper, zinc and nickel. A method for production of the composite and a containing and/or transport element for a fluid, preferably water, produced with the composite, are also provided.

Abstract: A non-porous composite is provided that includes a textile substrate impregnated with a first fluoropolymer and a film of polymeric material comprising at least one second fluoropolymer filled with porous particles of a silicate having a granulometric dimension d50 less than or equal to 5 ?m and a porosity ranging from 30 to 60% in volume and loaded with antibacterial ions of at least one metal selected from the group consisting of silver, copper, zinc and nickel. A method for production of the composite and a containing and/or transport element for a fluid, preferably water, produced with the composite, are also provided.

Abstract: (Semi-)continuous etching method for a fluoropolymer substrate (10) comprising steps of feeding (22) said substrate (10) in the form of a continuous ribbon wherein said substrate defines a primary surface (12), subjecting to at least one etching operations (2) a part of the primary surface (12) by means of an adhesion-promoting solution comprising a complex of an alkali metal in naphthalene, washing (4) the primary surface (12) wetted by the adhesion-promoting solution by means of a washing solution (42) comprising aqueous acetic acid/formic acid, and selectively separating a concentrated solution (24) of acetic acid/formic acid from the washing solution (42) by means of inverse osmosis operations (6, 8) at ? increasing pressures, and re-introducing at least a portion of the concentrated solution (24) of acetic acid/formic acid in the washing solution (42) to create a recirculation. The invention further relates to an etching plant.

Abstract: (Semi-) continuous etching method for a fluoropolymer substrate (10) comprising steps of feeding (22) said substrate (10) in the form of a continuous ribbon wherein said substrate defines a primary surface (12), subjecting to at least one etching operations (2) a part of the primary surface (12) by means of an adhesion-promoting solution comprising a complex of an alkali metal in naphthalene, washing (4) the primary surface (12) wetted by the adhesion-promoting solution by means of a washing solution (42) comprising aqueous acetic acid/formic acid, and selectively separating a concentrated solution (24) of acetic acid/formic acid from the washing solution (42) by means of inverse osmosis operations (6, 8) at ? increasing pressures, and re-introducing at least a portion of the concentrated solution (24) of acetic acid/formic acid in the washing solution (42) to create a recirculation. The invention further relates to an etching plant.