Abstract: An infrared surface light source generating device includes a substrate layer and a carbon material layer formed on a surface of the substrate layer and having a sheet resistance value ranged between 0.01 and 1000?/?. The carbon material layer is able to emit far infrared rays when it is heated by an amount of external low-power energy to a temperature above 36° C. A method of manufacturing the above infrared surface light source generating device is also disclosed. The method includes the steps of (A) providing a substrate layer and (B) forming a carbon material layer that is located on a surface of the substrate layer and has a sheet resistance value ranged between 0.01 and 1000?/?. Since the method involves only a simplified manufacturing process, the infrared surface light source generating device can be manufactured at reduced cost.

Abstract: A method of producing reduced graphene oxide includes the steps of selecting a substrate; forming a carbon layer on a top of the substrate through sputter deposition or vapor deposition; subjecting the substrate and the carbon layer to an oxidation process at the same time for the carbon layer to form a graphene oxide layer; and subjecting the substrate and the graphene oxide layer to a reduction process at the same time to form a reduced graphene oxide layer on the substrate. With the method, low-cost, high-quality and large-area reduced graphene oxide sheet can be directly produced on different types of substrate, including metal and non-metal substrates.

Abstract: An infrared surface light source generating device includes a substrate layer and a carbon material layer formed on a surface of the substrate layer and having a sheet resistance value ranged between 0.01 and 1000?/?. The carbon material layer is able to emit far infrared rays when it is heated by an amount of external low-power energy to a temperature above 36° C. A method of manufacturing the above infrared surface light source generating device is also disclosed. The method includes the steps of (A) providing a substrate layer and (B) forming a carbon material layer that is located on a surface of the substrate layer and has a sheet resistance value ranged between 0.01 and 1000?/?. Since the method involves only a simplified manufacturing process, the infrared surface light source generating device can be manufactured at reduced cost.