Patents Assigned to Hamamatsu Systems, Inc.
  • Patent number: 4655592
    Abstract: An apparatus and method are disclosed for detecting the presence of particles on the surface of a material, such as a semiconductor wafer, using the principle of scattered light. Light from a mercury arc lamp is collimated by a Cassegrain mirror collimator. The collimated beam of light is deflected by an annular shaped 45.degree. mirror toward a truncated annular shaped inverted parabolic mirror. Light striking the parabolic mirror is reflected outward in all directions as a converging beam of light toward a ring mirror. Light striking the ring mirror is reflected inward and strikes the surface from all directions at an angle of about 78.degree. to 86.degree. from normal incidence as a small spot.
    Type: Grant
    Filed: December 30, 1983
    Date of Patent: April 7, 1987
    Assignee: Hamamatsu Systems, Inc.
    Inventor: Charly D. Allemand
  • Patent number: 4455087
    Abstract: A monochromatic imaging apparatus comprising a pair of similar diffraction gratings, a pair of focusing lenses, a pair of collimating lenses, an entrance slit, an exit slit and an intermediate slit, and means for concurrently moving the two gratings; wherein a polychromatic source image is placed at the entrance slit, and a collimating lens collimates the light rays from the source image and projects the collimated rays onto the first diffraction grating thereby to disperse the rays. The dispersed rays are then focused by the first focusing lens onto the intermediate slit, and then collimated by the second collimating lens onto the second diffraction grating which thereupon recombines the dispersed light. The recombined rays are then focused by the second focusing lens onto the exit slit.
    Type: Grant
    Filed: April 6, 1981
    Date of Patent: June 19, 1984
    Assignee: Hamamatsu Systems Inc.
    Inventors: Charly D. Allemand, David L. Brewer
  • Patent number: 4412246
    Abstract: A method is disclosed for adjusting a polarizing or interference type video microscope system so as to achieve significant improvement in resolution, contrast, speed of recording, image fidelity and visibility of fine detail, the video microscope system including (1) a polarizing or interference type microscope having an iris diaphragm and a compensator and (2) a video camera having an adjustable gain control circuit and an adjustable DC restoration circuit. The method involves lowering the gain and the clamp level of the DC restoration circuit in the video camera to a minimum, then adjusting the microscope for optimum optical imaging conditions, these conditions including partly closing the iris diaphragm and setting the compensator for .+-. approximately the same bias retardation as the specimin (i.e. .lambda./100-.lambda./50), then opening the diaphragm to the maximal working aperture of the microscope objective and setting the compensator at a bias retardation of around .lambda./9 to .lambda.
    Type: Grant
    Filed: July 13, 1981
    Date of Patent: October 25, 1983
    Assignee: Hamamatsu Systems, Inc.
    Inventors: Robert D. Allen, Nina S. Allen
  • Patent number: 4394688
    Abstract: A video system having a television camera, a digital video signal processor coupled to the output of the television camera and a television monitor coupled to the output of the digital video signal processor is disclosed.
    Type: Grant
    Filed: August 25, 1981
    Date of Patent: July 19, 1983
    Assignee: Hamamatsu Systems, Inc.
    Inventors: Hitoshi Iida, Pay-Shin King
  • Patent number: 4377340
    Abstract: A method and apparatus for detecting and measuring the number and sizes of impurities on the surface of a material, such as a semiconductor wafer, wherein high intensity collimated light is directed onto the surface, in the absence of any extraneous light, through a collimating mirror, and employing a point source, whereat the particles will scatter the light, and wherein the surface is viewed by a highly light sensitive TV camera which picks up the scattered light and displays same on a viewing screen. The intensity of scattered light will indicate the size of the particles when compared with a calibrated model. Advantageously, a broad range of light waves is employed and thus enables a range of sizes of particles to be detected by the light scattered thereby. Also, advantageously, with the use of ordinarily available equipment, the system can inspect wafer surfaces for particles having sizes as small as 0.3 microns.
    Type: Grant
    Filed: October 24, 1980
    Date of Patent: March 22, 1983
    Assignee: Hamamatsu Systems, Inc.
    Inventors: Gary P. Green, Charly D. Allemand, David L. Brewer, Hitoshi Iida, Mario A. Maldari