Patents Assigned to HANA TECH Co., Ltd.
  • Publication number: 20180080150
    Abstract: Disclosed is a high-tenacity circular fabric made of normal yarn rather than high-tenacity yarn. The high-tenacity circular fabric has a weight in a range of 150 g/sqm to 400 g/sqm and is woven with yarn having strength in a range of 3 g/den to 6 g/den, wherein the yarn is woven into the high-tenacity circular fabric by a circular knitting machine, and a cam of the circular knitting machine is formed with grooves which are sequentially formed according to arrangement of a running position, a clearing position, a modified running position, a tuck position and a knock-over position.
    Type: Application
    Filed: December 30, 2016
    Publication date: March 22, 2018
    Applicant: HANA TECH Co., Ltd.
    Inventor: Jung Min KIM