Abstract: The invention pertains to a process for the production of particle beam systems (10-10??, 12-12?), in which at least one first particle beam system (10-10??) is produced on a first substrate (14) by computer-guided particle beam-induced deposition, and the minimum of one first particle beam system (10-10??) is used to produce at least one second particle beam system (12-12?) on at least one second substrate (16) by computer-guided particle beam-induced deposition. The inventive process makes it possible to produce a large number of particle beam systems in a relatively short time.