Abstract: An electron beam vaporizer with an electron beam generator (1), a first magnetic deflector system (7) with parallel elongate pole plates (8) for linear beam deflection along a first coordinate, and with a second magnetic deflector system (10) for beam deflection along a second coordinate, perpendicular to the first coordinate. An elongate vaporizing crucible (6) holds the material to be vaporized. To solve the problem of maintaining focus even over large deflection angles and to be able to correct the deflection pattern, the invention proposes the following:(a) the second magnetic deflection system (10) has two parallel, non-metallic coil cores (11) which extend parallel to the pole plates (8) of the first deflection system (7) and are disposed below them.