Abstract: The present disclosure is directed to a negative electrode active material for lithium secondary batteries, to a method for preparing the same, and to a lithium secondary battery including the same, the negative electrode active material including a porous core in which scaly silicon fragments are connected in an entangled manner; and a shell layer covering the core, where the shell layer includes a carbon-based material and silicon, and the shell layer has a thickness in a range of more than 10 to less than 60% with respect to an average particle diameter D50 of the negative electrode active material.

Abstract: The present disclosure is directed to a negative electrode active material for lithium secondary batteries, to a method for preparing the same, and to a lithium secondary battery including the same, the negative electrode active material including a porous core in which scaly silicon fragments are connected in an entangled manner; and a shell layer covering the core, where the shell layer includes a carbon-based material and silicon.

Abstract: The disclosure relates to an anode active material having a core-shell structure, the anode active material including a core including porous spherical particles including metal particles and amorphous carbon, and a shell including one or more of crystalline carbon and amorphous carbon, in which the metal particles of the core are physically connected to each other through the amorphous carbon of the core, a method of preparing the same, and a lithium secondary battery including the same.

Abstract: The present disclosure relates to an anode slurry composition for secondary batteries, comprising an anode active material; and a binder including a copolymer of (meth)acrylic acid monomer, acrylonitrile-based monomer, and (meth)acrylamide monomer, wherein a value obtained by dividing an absolute value of a zeta potential of the binder by an oxygen content per specific surface area of the anode active material is in a range from 0.6×10?5 mV·m2/g to 2.0×10?5 mV·m2/g.

Abstract: The present invention provides a dual-curable hybrid adhesive composition including a photo-initiator, a thermal initiator, and a thiol group-containing compound, and more particularly, to an adhesive composition which may be cured through a single curing by ultraviolet (UV) light or heat, and where thermal curing proceeds concurrently with UV curing by a heat generated during the UV curing such that even a light shield portion which may not transmit UV light therethrough may be sufficiently cured.

Abstract: The present invention relates to quantum dot-polymer composite particles and a method for preparing same, the composite particles comprising: quantum dots; and a (meth)acrylic polymer coating layer formed to surround the surface of the quantum dots, and to a technology for expanding the application of quantum dots which can ensure high stability and excellent luminous efficiency by including the polymer coating layer.

Abstract: The present invention relates to a method for producing a high yield of an organometallic compound including a step of allowing a metal hexacarbonyl compound to react with a hexahydro-1,3,5-triazine compound, and a thin film having excellent properties, fabricated by depositing the produced organometallic compound.

Abstract: The present invention relates to a vapor deposition compound enabling thin-film deposition through vapor deposition, and particularly to nickel and cobalt precursors capable of being applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and having superior thermal stability and reactivity, and a method of preparing the same.

Abstract: The present invention relates to precursor compounds, and more particularly to nonpyrophoric precursor compounds suitable for use in thin film deposition through atomic layer deposition (ALD) or chemical vapor deposition (CVD), and to an ALD/CVD process using the same.

Abstract: The present disclosure relates to an ion-conductive polymer, an electrode including the same, and a lithium secondary battery including the electrode. The ion-conductive polymer includes a first monomer represented by Formula 1 below. In Formula 1, A, L1 to L2, L11, a1 to a2, a11, R1 to R3, and n1 to n2 are as defined in the detailed description.

Abstract: The present invention relates to a compound that is capable of being used in thin-film deposition using vapor deposition. Particularly, the present invention relates to a rare earth compound, which is capable of being applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and which has excellent thermal stability and reactivity, a rare earth precursor including the same, a method of manufacturing the same, and a method of forming a thin film using the same.

Abstract: The present invention relates to a vapor deposition compound enabling thin-film deposition through vapor deposition, and more particularly to a novel cobalt precursor, which can be applied to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and exhibits superior reactivity, volatility and thermal stability, a method of preparing the same and a method of manufacturing a thin film using the same.

Abstract: The present invention relates to a vapor deposition compound capable of thin film deposition through vapor deposition, and particularly to a silicon precursor capable of being applied to ALD or CVD, and specifically, enabling high temperature deposition, and a method of manufacturing a silicon-containing thin film.

Abstract: An organometallic compound, which enables thin-film deposition through vapor deposition, and particularly to a Co or Fe precursor, which is suitable for use in atomic layer deposition or chemical vapor deposition, and a method of preparing the same.

Abstract: The present invention relates to a vapor deposition compound which serves to deposit a thin film through vapor deposition. More particularly, the present invention relates to vapor deposition zirconium, titanium, and hafnium precursors which are applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD) and which have low viscosity, excellent thermal stability, and fast self-saturation, and a method of preparing the same.

Abstract: A method of depositing a ruthenium metal thin film or ruthenium oxide thin film comprising a ruthenium compound used for depositing metallic Ru or RuO2 thin film on a substrate via atomic layer deposition, and the ruthenium compound represented by Chemical Formula 1, wherein L is a ligand selected from the group consisting of 1-ethyl-1,4-cyclohexadiene, 1,3-butadiene, and isoprene.

Abstract: The present invention relates to a ruthenium compound including a specific ligand structure of 1-ethyl-1,4-cyclohexadiene, 1,3-butadiene or isoprene and having superior thermal stability, vaporizing property and step coverage, and a thin film deposited using same.