Patents Assigned to Haven Technology
-
Publication number: 20140260993Abstract: A multi-phase separation apparatus shapes fluid flow in a flow shaping line preferably shaped to have a plurality of loops with consecutively decreasing diameters. Shaping the two-phase flow drives the heavier, denser fluids to the outside wall of the flow shaping line and allows the lighter, less dense fluids such as gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall, an exit port on the inner wall permits a majority, if not all, of the gas, along with a minimal amount of liquid, to be diverted to a conventional gas-liquid separator at a flow rate much lower than the total flow rate within the flow shaping line. The remaining liquid flow in the flow shaping line is subsequently introduced into an adjustable phase splitter to separate different liquid components from one another.Type: ApplicationFiled: March 15, 2013Publication date: September 18, 2014Applicant: HAVEN TECHNOLOGYInventor: HAVEN TECHNOLOGY
-
Patent number: 8574351Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.Type: GrantFiled: March 18, 2013Date of Patent: November 5, 2013Assignee: Haven TechnologyInventors: David James Elms, Gregory Allen Hudspeth
-
Publication number: 20130220629Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.Type: ApplicationFiled: March 18, 2013Publication date: August 29, 2013Applicant: Haven TechnologyInventor: Haven Technology
-
Patent number: 8419833Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.Type: GrantFiled: February 3, 2011Date of Patent: April 16, 2013Assignee: Haven TechnologyInventors: David James Elms, Gregory Allen Hudspeth
-
Publication number: 20120199000Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.Type: ApplicationFiled: February 3, 2011Publication date: August 9, 2012Applicant: Haven TechnologyInventors: David James Elms, Greg Allen Hudspeth