Patents Assigned to Haven Technology
  • Publication number: 20240252780
    Abstract: The present disclosure generally relates, in certain embodiments, to light-based treatments. In some case, a subject having or at risk for a condition such as insomnia can be treated, e.g., with light, such as green light. Other conditions include sleep disorders such as sleep apnea and other indications. In some cases, the light that is administered to the subject may be green light, or the light may have a characteristic wavelength only in a wavelength range between 510 nm and 550 nm with a bandwidth no larger than 20 nm full-width-half-maximum. Other embodiments described herein are generally directed to systems for treating such conditions, kits for treating such conditions, or the like.
    Type: Application
    Filed: November 12, 2021
    Publication date: August 1, 2024
    Applicants: Haven Technologies Inc., Beth Israel Deaconess Medical Center, Inc.
    Inventors: Rami Burstein, Mark Severs, Jeff Sheely, Ajay Shashidar Kori
  • Publication number: 20240009420
    Abstract: The present disclosure generally relates, in certain embodiments, to light-based treatments. In some case, a subject having or at risk for a condition such as insomnia can be treated, e.g., with light, such as green light. Other conditions include sleep disorders such as sleep apnea and other indications. In some cases, the light that is administered to the subject may be green light, or the light may have a characteristic wavelength only in a wavelength range between 510 nm and 550 nm with a bandwidth no larger than 20 nm full-width-half-maximum. Other embodiments described herein are generally directed to systems for treating such conditions, kits for treating such conditions, or the like.
    Type: Application
    Filed: November 12, 2021
    Publication date: January 11, 2024
    Applicants: Haven Technologies Inc., Beth Israel Deaconess Medical Center, Inc.
    Inventors: Rami Burstein, Mark Severs, Jeff Sheely, Ajay Shashidar Kori
  • Patent number: 11351479
    Abstract: A fluid separation apparatus for removing one fluid component from another fluid component in a fluid stream includes an impeller disposed between an annular inlet chamber and a first fluid chamber having a hollow, conical trapezoidal shape with a diameter that reduces along a portion of the length of the first fluid chamber. The impeller redirects a liquid flowing in a circular swirling flow path along the wall of the inlet chamber to an outlet an inlet of the first fluid chamber disposed adjacent the central axis of the first fluid chamber. A coaxially aligned extraction pipe extends into a lighter density fluid envelope formed in the first fluid chamber adjacent the inlet of the first fluid chamber. The extraction pipe may be dynamically adjustable based on the shape of the lighter density fluid envelope to maximize removal of lighter density fluid from the lighter density fluid envelope.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: June 7, 2022
    Assignee: Haven Technology Solutions LLC
    Inventors: David James Elms, Gregory Allen Hudspeth
  • Patent number: 9334970
    Abstract: A multi-phase separation flow management system includes a housing with an inlet, a first outlet and a second outlet and in which a movable element is mounted. The movable element has a first passageway with an inlet and an outlet and a second passageway having an inlet and an outlet, and are disposed in the element so that the inlets of the first and second passageways are adjacent one another and the outlets of the first and second passageways are spaced apart from one another. The inlets are disposed adjacent a housing inlet, the first passageway outlet is disposed adjacent a first housing outlet and the second passageway outlet is disposed adjacent a second housing outlet.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: May 10, 2016
    Assignee: Haven Technology Solutions LLC
    Inventors: David J. Elms, Gregory A. Hudspeth
  • Patent number: 9320989
    Abstract: A multi-phase separation apparatus shapes fluid flow in a flow shaping line preferably shaped to have a plurality of loops with consecutively decreasing diameters. Shaping the two-phase flow drives the heavier, denser fluids to the outside wall of the flow shaping line and allows the lighter, less dense fluids such as gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall, an exit port on the inner wall permits a majority, if not all, of the gas, along with a minimal amount of liquid, to be diverted to a conventional gas-liquid separator at a flow rate much lower than the total flow rate within the flow shaping line. The remaining liquid flow in the flow shaping line is subsequently introduced into an adjustable phase splitter to separate different liquid components from one another.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: April 26, 2016
    Assignee: Haven Technology Solutions, LLC.
    Inventors: David James Elms, Gregory Allen Hudspeth
  • Patent number: 8991426
    Abstract: A multi-phase separation flow management apparatus has a housing with an inlet, a first outlet and a second outlet and in which a movable element is mounted. The movable element has a first passageway with an inlet and an outlet and a second passageway having an inlet and an outlet, and are disposed in the element so that the inlets of the first and second passageways are adjacent one another and the outlets of the first and second passageways are spaced apart from one another. The inlets are disposed adjacent a housing inlet, the first passageway outlet is disposed adjacent a first housing outlet and the second passageway outlet is disposed adjacent a second housing outlet.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: March 31, 2015
    Assignee: Haven Technology Solutions LLC
    Inventors: David J. Elms, Gregory A. Hudspeth
  • Patent number: 8574351
    Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: November 5, 2013
    Assignee: Haven Technology
    Inventors: David James Elms, Gregory Allen Hudspeth
  • Publication number: 20130220629
    Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.
    Type: Application
    Filed: March 18, 2013
    Publication date: August 29, 2013
    Applicant: Haven Technology
    Inventor: Haven Technology
  • Patent number: 8419833
    Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.
    Type: Grant
    Filed: February 3, 2011
    Date of Patent: April 16, 2013
    Assignee: Haven Technology
    Inventors: David James Elms, Gregory Allen Hudspeth
  • Publication number: 20120199000
    Abstract: A two phase gas-liquid separation apparatus is provided that shapes the flow in a flow shaping line. Shaping the two-phase flow allows centrifugal force to send the heavier, denser liquid to the outside wall of the flow shaping line and allows the lighter, less dense vapor or gas to occupy the inner wall of the flow shaping line. With the gas positioned on the inner wall of the flow shaping line, an exit port on the inner wall will allow for the majority, if not all, of the gas, along with a low amount of liquid, to be sent to a conventional separator. A high ratio of vapor/liquid at a flow rate much lower than the total flow rate within the flow shaping line is sent to the conventional separator. This allows for efficient separation of the vapor from the liquid with the use of a smaller conventional separator.
    Type: Application
    Filed: February 3, 2011
    Publication date: August 9, 2012
    Applicant: Haven Technology
    Inventors: David James Elms, Greg Allen Hudspeth