Patents Assigned to Heat Mirror Associates
  • Method for multilayer thin film deposition
    Patent number: 4298444
    Abstract: Apparatus for sputter depositing two or more layers of material onto a substrate in one operation includes an evacuable chamber containing a transport mechanism, substrate support, and at least two deposition units situated proximate the support. The transport mechanism moves the substrate to and from the support. When at the support, the substrate is passed by one deposition unit and then the other for sputter deposition of a thin film of material by each unit.
    Type: Grant
    Filed: December 26, 1979
    Date of Patent: November 3, 1981
    Assignee: Heat Mirror Associates
    Inventor: Day Chahroudi
  • Apparatus for multilayer thin film deposition
    Patent number: 4204942
    Abstract: Apparatus for sputter depositing two or more layers of material onto a substrate in one operation includes an evacuable chamber containing a transport mechanism, substrate support, and at least two deposition units situated proximate the support. The transport mechanism moves the substrate to and from the support. When at the support, the substrate is passed by one deposition unit and then the other for sputter deposition of a thin film of material by each unit.
    Type: Grant
    Filed: October 11, 1978
    Date of Patent: May 27, 1980
    Assignee: Heat Mirror Associates
    Inventor: Day Chahroudi