Patents Assigned to HEFEI XINSHENG PHOTOELECTRIC TECHNOLOGY CO., LTD.
  • Patent number: 11281098
    Abstract: The present discloses is related to a method for manufacturing a touch substrate. The method of manufacturing the touch substrate may include depositing a first conductive film on a base substrate; performing a first joint exposure process based on a first negative photoresist on the base substrate on which the first conductive film was deposited to form a first electrode layer; forming an insulating layer on the base substrate on which the first electrode layer was formed; depositing a second conductive film on the base substrate on which the insulating layer was formed; and performing a second joint exposure process based on a second negative photoresist on the base substrate on which the second conductive film was deposited to form a second electrode layer.
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: March 22, 2022
    Assignees: HEFEI XINSHENG PHOTOELECTRIC TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Zhi Du, Qicheng Chen, Ming Zhang, Haifeng Hu, Liuyue Yin