Abstract: Waste gases and other noxious substances which are formed in connection with chemical processes and the manufacture of devices such as semiconductors and covalent hydrides and element organic compounds, etc. are treated so as to remove the noxious components.
Type:
Grant
Filed:
November 13, 1984
Date of Patent:
September 16, 1986
Assignee:
Heinrich-Hertz-Institute fur Nachrichtentechnik Berlin GmbH
Inventors:
Werner Fabian, Helmut Roehle, Peter Wolfram