Patents Assigned to Hermes Microvision, Inc. (Taiwan)
  • Patent number: 7705298
    Abstract: This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.
    Type: Grant
    Filed: November 13, 2007
    Date of Patent: April 27, 2010
    Assignee: Hermes Microvision, Inc. (Taiwan)
    Inventors: Xuedong Liu, Zhonghua Dong, Wei Fang, Zhong-Wei Chen
  • Publication number: 20090108199
    Abstract: This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.
    Type: Application
    Filed: November 13, 2007
    Publication date: April 30, 2009
    Applicant: Hermes Microvision, Inc. (TAIWAN)
    Inventors: Xuedong LIU, Zhonghua DONG, Wei FANG, Zhong-Wei CHEN
  • Publication number: 20090090866
    Abstract: A charged particle detector consists of four independent light guide modules assembled together to form a segmented on-axis annular detector, with a center opening for allowing the primary charged particle beam to pass through. One side of the assembly facing the specimen is coated with or bonded to scintillator material as the charged particle detection surface. Each light guide module is coupled to a photomultiplier tube to allow light signals transmitted through each light guide module to be amplified and processed separately. A charged particle detector is made from a single block of light guide material processed to have a cone shaped circular cutout from one face, terminating on the opposite face to an opening to allow the primary charged particle beam to pass through. The opposite face is coated with or bonded to scintillator material as the charged particle detection surface.
    Type: Application
    Filed: January 30, 2007
    Publication date: April 9, 2009
    Applicants: HERMES MICROVISION, INC., TAIWAN, Hermes-Microvision, Inc.
    Inventors: Xu ZHANG, Joe WANG, Zhong-Wei CHEN
  • Publication number: 20080296496
    Abstract: An electron beam apparatus and method are presented for regulating wafer surface potential during e-beam (scanning electron microscopy SEM) inspection and review. Regulating surface potential is often critical to detect voltage contrast (VC) defects of specific type, and sometimes, its also an important factor to achieve high quality SEM images.
    Type: Application
    Filed: May 30, 2007
    Publication date: December 4, 2008
    Applicant: Hermes Microvision, Inc. (TAIWAN)
    Inventors: Yan ZHAO, Joe Wang, Chi-Hua Tseng
  • Publication number: 20080006771
    Abstract: An electron beam apparatus and method are presented for collecting side-view and plane-view SEM imagery. The electron beam apparatus includes an electron source, some intermediate lenses if needed, an objective lens and an in-lens sectional detector. The electron source will provide an electron beam. The intermediate lenses focus the electron beam further. The objective lens is a combination of an immersion magnetic lens and a retarding electrostatic lens focuses the electron beam onto the specimen surface. The in-lens detector will be divided into two or more sections to collect secondary electrons emanating from the specimen with different azimuth and polar angle so that side-view SEM imagery can be obtained.
    Type: Application
    Filed: May 30, 2007
    Publication date: January 10, 2008
    Applicant: Hermes Microvision, Inc. (TAIWAN)
    Inventors: Chi-Hua Tseng, Zhong-Wei Chen, Xuedong Liu