Patents Assigned to HIA, Inc.
  • Patent number: 11456162
    Abstract: An apparatus has a cathode target with a cathode target outer perimeter. An inner magnet array with an inner magnet array inner perimeter is within the cathode target outer perimeter. The inner magnet array includes an inner magnet array base portion and an inner magnet array upper portion. A keeper plate assembly is connected to the inner magnet array upper portion and isolates the inner magnet array upper portion from the inner magnet array base portion. An outer magnet array is connected to a bottom surface of the keeper plate. The outer magnet array has an outer magnet array outer perimeter larger than the inner magnet array inner perimeter. The inner magnet array upper portion has a first magnetic orientation and the outer magnet array and the inner magnet array base portion have a second magnetic orientation opposite the first magnetic orientation.
    Type: Grant
    Filed: December 5, 2018
    Date of Patent: September 27, 2022
    Assignee: HIA, Inc.
    Inventors: Samuel D. Harkness, IV, Quang N. Tran
  • Publication number: 20190043701
    Abstract: A magnet pack has a permeable assembly with a first cutout for a center magnet and second cutouts for peripheral magnets surrounding the center magnet. A target is attached to the permeable assembly. A heatsink is attached to the target. Emanating magnetic fields from the magnet pack progress from an inner atmospheric side to a position substantially within a vacuum cavity. The emanating magnetic fields from the center magnet are substantially stronger than the emanating magnetic fields from the peripheral magnets.
    Type: Application
    Filed: July 31, 2018
    Publication date: February 7, 2019
    Applicant: HIA, Inc.
    Inventors: Samuel D. Harkness, IV, Quang N. Tran
  • Patent number: 9911583
    Abstract: An apparatus has a primary cathode configured for free space interaction with a substrate operative as an anode. A first annular cathode faces a second annular cathode. The primary cathode, the first annular cathode, the second annular cathode are axially aligned. The outer diameters of the first annular cathode and the second annular cathode correspond to the outer diameter of the primary cathode. The primary cathode provisions deposited material on the substrate with controllable plasma density to levels above 1×1018 m?3, with ignition capability above 0.05 Pa.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: March 6, 2018
    Assignee: HIA, Inc.
    Inventors: Samuel D. Harkness, IV, Quang N. Tran
  • Publication number: 20180005806
    Abstract: An apparatus has a cathode target with a cathode target outer perimeter. An inner magnetic array with an inner magnetic array inner perimeter is at the cathode target outer perimeter. An outer magnetic array has an outer magnetic array outer perimeter larger than the inner magnetic array inner perimeter. The inner magnetic array and the outer magnetic array are concentric and each have a single, common, parallel magnetic orientation to form a magnetic field environment that defines a plasma confinement zone adjacent the target cathode and the plasma confinement zone causes a gas operative as a reactive gas and sputter gas to become ionized and thus be directed to the target cathode and cause a second set of ions including species from the target to disperse across a substrate.
    Type: Application
    Filed: June 29, 2017
    Publication date: January 4, 2018
    Applicant: HIA, Inc.
    Inventors: Samuel D. Harkness, IV, Quang N. Tran