Patents Assigned to Hideo Ohno
  • Publication number: 20110175090
    Abstract: In a thin film transistor, a gate insulating layer is formed on a gate electrode formed on an insulating substrate. Formed on the gate insulating layer is a semiconductor layer. Formed on the semiconductor layer are a source electrode and a drain electrode. A protective layer covers them, so that the semiconductor layer is blocked from an atmosphere. The semiconductor layer (active layer) is made of, e.g., a semiconductor containing polycrystalline ZnO to which, e.g., a group V element is added. This allows practical use of a semiconductor device which has an active layer made of zinc oxide and which includes an protective layer for blocking the active layer from an atmosphere.
    Type: Application
    Filed: March 28, 2011
    Publication date: July 21, 2011
    Applicants: Sharp Kabushiki Kaisha, Hideo Ohno, Masashi Kawasaki
    Inventors: Toshinori Sugihara, Hideo Ohno, Masashi Kawasaki
  • Patent number: 4253061
    Abstract: In a high voltage or current detector of the type utilizing an insulating tube, polarized light is directed to a photoelectric element mounted on the upper end or contained in the insulating tube so as to modulate the polarized light in accordance with the voltage or current to be measured. The modulated light is directed to a photosensitive element on the lower end of the tube for producing an electric signal which is applied to a meter for displaying the voltage or current.
    Type: Grant
    Filed: November 16, 1978
    Date of Patent: February 24, 1981
    Assignees: Goro Eto, Hideo Ohno
    Inventors: Toshiharu Ono, Sensaku Ikeda, Hideo Ohno