Patents Assigned to Hitachi Cable Co., Ltd.
  • Patent number: 8440549
    Abstract: A semiconductor epitaxial substrate includes: a single crystal substrate; an AlN layer epitaxially grown on the single crystal substrate; and a nitride semiconductor layer epitaxially grown on the AlN layer, wherein an interface between the AlN layer and nitride semiconductor layer has a larger roughness than an interface between the single crystal substrate and AlN layer, and a skewness of the upper surface of the AlN layer is positive.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: May 14, 2013
    Assignees: Fujitsu Limited, Hitachi Cable Co., Ltd.
    Inventors: Kenji Imanishi, Toshihide Kikkawa, Takeshi Tanaka, Yoshihiko Moriya, Yohei Otoki
  • Patent number: 8264006
    Abstract: A semiconductor epitaxial substrate includes: a single crystal substrate; an AlN layer epitaxially grown on the single crystal substrate; and a nitride semiconductor layer epitaxially grown on the AlN layer, wherein an interface between the AlN layer and nitride semiconductor layer has a larger roughness than an interface between the single crystal substrate and AlN layer, and a skewness of the upper surface of the AlN layer is positive.
    Type: Grant
    Filed: May 3, 2010
    Date of Patent: September 11, 2012
    Assignees: Fujitsu Limited, Hitachi Cable Co., Ltd.
    Inventors: Kenji Imanishi, Toshihide Kikkawa, Takeshi Tanaka, Yoshihiko Moriya, Yohei Otoki
  • Publication number: 20120067275
    Abstract: A semiconductor epitaxial substrate includes: a single crystal substrate; an AlN layer epitaxially grown on the single crystal substrate; and a nitride semiconductor layer epitaxially grown on the AlN layer, wherein an interface between the AlN layer and nitride semiconductor layer has a larger roughness than an interface between the single crystal substrate and AlN layer, and a skewness of the upper surface of the AlN layer is positive.
    Type: Application
    Filed: September 20, 2011
    Publication date: March 22, 2012
    Applicants: HITACHI CABLE CO., LTD., FUJITSU LIMITED
    Inventors: Kenji Imanishi, Toshihide Kikkawa, Takeshi Tanaka, Yoshihiko Moriya, Yohei Otoki
  • Patent number: 8044492
    Abstract: A semiconductor epitaxial substrate includes: a single crystal substrate; an AlN layer epitaxially grown on the single crystal substrate; and a nitride semiconductor layer epitaxially grown on the AN layer, wherein an interface between the AlN layer and nitride semiconductor layer has a larger roughness than an interface between the single crystal substrate and AlN layer, and a skewness of the upper surface of the AlN layer is positive.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: October 25, 2011
    Assignees: Fujitsu Limited, Hitachi Cable Co., Ltd.
    Inventors: Kenji Imanishi, Toshihide Kikkawa, Takeshi Tanaka, Yoshihiko Moriya, Yohei Otoki
  • Patent number: 5677973
    Abstract: The orientation of the rotating direction of an optical fiber in an optical fiber array takes the positional axial displacement into consideration. In a method of aligning the orientation of optical fibers, or the axial displacement in an optical fiber array having a plurality of optical fibers, and an optical fiber holding member, an enlarged image of the optical fiber is obtained for each of the optical fibers using an image pick-up means. Then, a distribution of the characterized image corresponding to the positions in the radial direction of the image of the optical fiber are obtained from the enlarged image. From the distribution of the characterized image, the orientation of the rotational direction to the center of the optical fiber, or the positional axial displacement of the core center, is measured.
    Type: Grant
    Filed: June 30, 1995
    Date of Patent: October 14, 1997
    Assignee: Hitachi Cable Co., Ltd.
    Inventors: Toshiya Yuhara, Hisao Iitsuka, Hiroshi Kajioka, Mamoru Ichimura, Tomohiro Murakami