Patents Assigned to Hitachi Chemical Company, Inc.
  • Patent number: 5262277
    Abstract: A photosensitive resin composition comprising (A) a polymer obtained by reacting an isocyanate compound having an ethylenic unsaturated group with a polymer which is a reaction product of a tetracarboxylic acid dianhydride and a diamine, and (B) a photoinitiator, can provide a thick film excellent in heat resistant, adhesiveness, flexibility, electrical and mechanical properties, and is particularly suitable for producing a photosensitive element.
    Type: Grant
    Filed: January 22, 1992
    Date of Patent: November 16, 1993
    Assignee: Hitachi Chemical Company, Inc.
    Inventors: Kuniaki Sato, Yasunori Kojima, Shigeo Tachiki, Tohru Kikuchi, Toshiaki Ishimaru, Nobuyuki Hayashi, Mitsumasa Kojima
  • Patent number: 5234522
    Abstract: A flexible printed-circuit board covered with a coverlay is produced by bonding (a) a flexible printed-circuit board that comprises a flexible base having a surface bearing a circuit and (b) a polyimide film having a surface treated to increase adhering property and another surface not treated to increase adhering property, each of the surfaces being coated with an adhesive layer, with the adhesive layer on the surface treated to increase adhering property interposed between the polyimide film and the surface bearing the circuit, and then peeling off the adhesive layer coating the polyimide film on the surface not treated to increase adhering property.
    Type: Grant
    Filed: November 27, 1991
    Date of Patent: August 10, 1993
    Assignee: Hitachi Chemical Company, Inc.
    Inventors: Masakatsu Suzuki, Junichi Imaizumi, Hiroshi Nomura, Kouichi Nagao, Yasushi Katoh, Takato Oti, Eikichi Satou
  • Patent number: 4198499
    Abstract: Resol type phenol resins containing scarcely or no phenol mononucleus compounds (monomers) and phenol dinuclei compounds (dimers) and their methylolated derivatives and scarcely containing molecules having an apparent molecular weight of more than 2500 are produced by reacting phenol with formaldehyde in the presence of an alkaline catalyst in a molar ratio of 3.0 to 6.0 moles of formaldehyde and 0.05 to 2.0 moles of the alkaline catalyst per mole of phenol, neutralizing the reaction solution with an acid to pH 4.5 to 6.5 and precipitating the resulting product for separation.
    Type: Grant
    Filed: August 28, 1978
    Date of Patent: April 15, 1980
    Assignee: Hitachi Chemical Company, Inc.
    Inventors: Susumu Konii, Masatoshi Yoshida, Yukio Yoshimura, Takehiko Ishibashi, Shizuo Sakamoto