Patents Assigned to Hitachi Chemical Company, Ltd. (FIPAS)
  • Patent number: 11921424
    Abstract: There are provided a photosensitive resin composition which can be applied to either a projection exposure or direct-write exposure machine without fine adjustment of the composition, and can form a resist pattern having an excellent cross-sectional shape in which an undercut in which the bottom portion of the resist pattern is hollowed and omission of the top of the resist pattern are less likely to occur, and a line width of an intermediate portion (central portion) and a deepest portion (bottom portion) in the depth direction of the cross section of the resist pattern is less likely to be larger than a line width of the surface portion (that is, linearity in the depth direction of the resist pattern contour is favorable), and which has excellent insulation reliability and crack resistance reliability, and a dry film using the same, a printed wiring board, and a printed wiring board manufacturing method.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: March 5, 2024
    Assignee: Hitachi Chemical Company, Ltd. (FIPAS)
    Inventors: Nobuhito Komuro, Yuta Daijima, Masayuki Kojima, Shinji Irizawa, Shinya Oosaki