Patents Assigned to Hitachi Global Storage Technologies Netherlands B.B.
  • Substrate independent superpolishing process and slurry
    Patent number: 6801396
    Abstract: The present invention utilizes a combination of chemical and mechanical finishing processes to polish a disk substrate surface to near atomic smoothness. Broadly speaking, the surface of a disk substrate that has been machined (i.e., rough ground) to a predetermined surface roughness is subjected to attack by a chemical formulation (called an attacking agent). The chemical formulation is used to soften the substrate material. Then, the softened material is “wiped away” via mechanical action.
    Type: Grant
    Filed: November 5, 1997
    Date of Patent: October 5, 2004
    Assignee: Hitachi Global Storage Technologies Netherlands B.B.
    Inventors: Brent Ray Den Hartog, Dennis Leonard Fox, James Aloysius Hagan, John Chen Shen, Kannimangalam Venkatasubramanyam Viswanathan