Patents Assigned to Hitachi High-Tech Control Systems Corporation
  • Apparatus and method for detecting vaporized gas
    Patent number: 7364917
    Abstract: For detecting a component of a substance (of liquid or solid) on a front surface of a substrate, the substrate with the substance thereon is transferred into a vaporizing section, the substance is heated in the vaporizing section so that the component is vaporized from the substance in the vaporizing section, the component vaporized is fed from the substance in the vaporizing section to a detecting section, and the vaporized component is detected in the detecting section.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: April 29, 2008
    Assignee: Hitachi High-Tech Control Systems Corporation
    Inventors: Satoshi Ichimura, Masami Sakamoto, Toshio Iwasaki