Abstract: It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.
Type:
Application
Filed:
December 17, 2012
Publication date:
March 5, 2015
Applicant:
HITACHI HIGH-TECHNOLGIES CORPORATION
Inventors:
Kotoko Urano, Tomonori Nakano, Yoichi Ose
Abstract: Provided is a liquid chromatograph system and method configured to accurately obtain measurements by minimizing deviations in measurements due to a transfer from one measurement method to another measurement method. An aspect of the system and method includes minimizing deviations in measurements when a measurement method from a measurement system of a liquid chromatograph is transferred to measurement system under high pressure and high velocity. Such a transfer includes deviations due to differences in analysis conditions. The present subject matter uses a dwell volume value so as to minimize a deviation of measurement result due to methods before and after transfer. Another aspect includes calculating a correction value when there is a deviation in the measurement result, and automatically reflecting the correction value for the method transfer.
Type:
Grant
Filed:
May 21, 2009
Date of Patent:
June 26, 2012
Assignee:
Hitachi High-Technolgies Corporation
Inventors:
Takaaki Suzuki, Masato Fukuda, Masahito Ito
Abstract: A scanning electron microscope comprises an image processing system for carrying out a pattern matching between a first image and a second image. The image processing system comprises: a paint-divided image generator for generating a paint divided image based on the first image; a gravity point distribution image generator for carrying out a smoothing process of the paint divided image and generating a gravity point distribution image; an edge line segment group generation unit for generating a group of edge line segments based on the second image; a matching score calculation unit for calculating a matching score based on the gravity point distribution image and the group of edge line segments; and a maximum score position detection unit for detecting a position where the matching score becomes the maximum.