Patents Assigned to Hitachi High-Technologies Corporation, Ltd.
  • Patent number: 7489395
    Abstract: A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.
    Type: Grant
    Filed: September 11, 2006
    Date of Patent: February 10, 2009
    Assignee: Hitachi High-Technologies Corporation, Ltd.
    Inventors: Minoru Yoshida, Shunji Maeda, Atsushi Shimoda, Kaoru Sakai, Takafumi Okabe
  • Patent number: 6989531
    Abstract: The invention relates to an LC/MS interface provided with structure that the end of a spray capillary is rarely damaged and the object is to provide the LC/MS interface which a general user can easily operate, which inhibits the extension of a separation band and the deterioration of detection sensitivity and which enables high separation and sensitive analysis. A metallic member having a hole for connecting a separation column and a spray capillary and a resin member for fixing the upstream side of the short spray capillary are used. Further, to enhance operability, spray ionization using gas spraying is used.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: January 24, 2006
    Assignee: Hitachi High-Technologies Corporation, Ltd.
    Inventors: Atsumu Hirabayashi, Masako Ishimaru, Masahiro Yamaoka