Patents Assigned to Hitachi Instrument Engineering Co.
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Publication number: 20040230381Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal With respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.Type: ApplicationFiled: October 28, 2003Publication date: November 18, 2004Applicants: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Masahito Ito, Kisaburo Deguchi, Yoshiaki Seki
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Patent number: 6675107Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal with respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.Type: GrantFiled: December 16, 2002Date of Patent: January 6, 2004Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Masahito Ito, Kisaburo Deguchi, Yoshiaki Seki
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Patent number: 6542830Abstract: A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.Type: GrantFiled: September 10, 1998Date of Patent: April 1, 2003Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa, Yuichi Ohyama, Hidekuni Sugimoto, Seiji Ishikawa, Masataka Shiba, Jun Nakazato, Makoto Ariga, Tetsuji Yokouchi, Toshimitsu Hamada, Ikuo Suzuki, Masami Ikota, Mari Nozoe, Isao Miyazaki, Yoshiharu Shigyo
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Patent number: 6529836Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal with respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.Type: GrantFiled: August 29, 2001Date of Patent: March 4, 2003Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Masahito Ito, Kisaburo Deguchi, Yoshiaki Seki
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Patent number: 6472663Abstract: Relationship among an exciting current of each lens of an irradiation lens system including at least two stages of irradiation lenses and an electron beam aperture, an irradiation electron beam density on a sample and an area of the sample surface irradiated with an electron beam is stored in a form of a table or equations, and an exciting condition of each of the lenses of the irradiation lens system is retrieved from the relationship and set the irradiation lens system to the retrieved condition, for example, when the enlarging magnification is changed under a condition of keeping the irradiation electron beam density at a constant value. Further, trails of a region of the sample surface irradiated with the electron beam is displayed on a display unit.Type: GrantFiled: October 29, 1998Date of Patent: October 29, 2002Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Isao Nagaoki, Hiroyuki Kobayashi, Takafumi Yotsuji
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Patent number: 6314374Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal with respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.Type: GrantFiled: May 1, 2000Date of Patent: November 6, 2001Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Masahito Ito, Kisaburo Deguchi, Yoshiaki Seki
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Patent number: 5972772Abstract: An electron beam drawing process of high throughput, coping with the changes in static distortion and dynamic distortion of a lower layer exposure apparatus or an optical reduction exposure apparatus. At least two marks formed in each chip formed on a wafer are detected for a predetermined number of chips, and the relation between the shape distortion of each chip in the wafer plane and the wafer coordinates is determined from the positions of the detected marks and the designed positions of the marks by a statistical processing. Patterns are drawn in all chips while correcting the patterns to be drawn on the individual chips, by using the relation between the determined chip shape distortion and the wafer coordinates. As a result, the superposition exposure with the lower layer can be achieved with a high throughput and with a high accuracy without any manual adjustment.Type: GrantFiled: September 3, 1997Date of Patent: October 26, 1999Assignees: Hitachi Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Minoru Sasaki, Yuji Tange, Yutaka Hojyo, Kazuyoshi Oonuki, Hiroyuki Itoh
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Patent number: 5903004Abstract: In an electron microscope employing an X-ray spectrometer according to the present invention, a collimator is provided in a head portion of the X-ray spectrometer and a part of the collimator is arranged in a leakage magnetic field of an objective lens included in the electron microscope, whereby the orbits of the scattering electrons are curved and hence the scattering electrons are prevented from colliding with the X-ray spectrometer to dissolve the background noises in the X-ray spectrumType: GrantFiled: August 14, 1997Date of Patent: May 11, 1999Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Shunsuke Koshihara, Mitsugu Sato, Naomasa Suzuki
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Patent number: 5898177Abstract: A method of operating an electron microscope under a high temperature and the electron microscope are provided. The electron microscope can stably set and efficiently heat a sample to observe and measure high temperature physical properties such as phase transformation, phase transition and the like required for development of a heat resistant material. In the method of operating the electron microscope and the electron microscope, a sample to be observed is set so as to position at a central hole of a double spiral flat filament, the detachable heating stage is fixed to the heating holder using screws of a pivot, and the heating stage is tilted by vertical movement of a crank-shaped arm. The heating stage and the arm are insulated from each other by an insulating body, and current from a power source is conducted by a conductor wire to heat the filament.Type: GrantFiled: July 24, 1997Date of Patent: April 27, 1999Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co. Ltd.Inventors: Kishio Hidaka, Takeo Kamino, Toshie Yaguchi, Katsuhisa Usami, Takashi Aoyama, Shigeyoshi Nakamura, Ryo Hiraga, Masahiro Tomita
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Patent number: 5789252Abstract: A body fluid sample and a reagent are reacted in a reaction container, and after measuring the reaction solution the reaction solution is discharged from the reaction container. The vacant reaction container is washed by charging a detergent solution containing plural kinds of surface active agents through a nozzle of a washing mechanism. The detergent solution is a mixed solution containing polyoxyethylene alkyl ether, polyoxyethylene polyoxypropylene glycol ether, N-acyl amino acid salt and polyacrylic salt. By the washing method in accordance with the present invention, it is possible to eliminate bad effects due to incomplete washing of reaction containers in an apparatus for automatically successively analyzing biological samples.Type: GrantFiled: October 17, 1996Date of Patent: August 4, 1998Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Hiroko Fujita, Mitsuo Hattori, Emi Murakami, Yasuhisa Shibata
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Patent number: 5721942Abstract: A personal information display system is provided with a portable information display device for reading information to be used from a storage medium, a communication network for transmission of information, input/output apparatus for input/output of information, an input/output control apparatus connected between the communication network and the input/output apparatus, an information control apparatus having a hierarchical memory connected to the communication network, and an information output apparatus connected to the information control apparatus to transfer information to the storage medium of the portable information display device.Type: GrantFiled: November 13, 1991Date of Patent: February 24, 1998Assignees: Hitachi Maxell, Ltd., Hitachi, Ltd., Hitachi Computer Peripherals Co., Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Nobumasa Nishiyama, Hiroaki Koyanagi, Kouichi Hoashi, Sayaka Shinomoto, Ryuichiroh Tamochi, Kouji Takai
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Patent number: 5684315Abstract: A semiconductor memory device has memory cells provided at intersections between word line conductors and data line conductors. Each of the memory cells includes a cell selecting transistor and an information storage capacitor. The capacitor in each of the memory cells includes a first capacitor component formed over the control electrode of the transistor and a second capacitor component formed over a word line conductor which is adjacent to a word line conductor integral with the control electrode of the transistor. Each of the first and second capacitor components has a common electrode, a storage electrode and a dielectric film sandwiched therebetween, and the storage electrode is at a level higher than the common electrode in each of said first and second capacitor components. The storage electrodes of the first and second capacitor components are electrically connected with each other and with one of the semiconductor regions of the transistor.Type: GrantFiled: December 23, 1994Date of Patent: November 4, 1997Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd., Hitachi ULSI Engineering Corporation, Hitachi Hokkai Semiconductor, Ltd.Inventors: Hiroyuki Uchiyama, Yoshiyuki Kaneko, Hiroki Soeda, Yasuhide Fujioka, Nozomu Matsuda, Motoko Sawamura
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Patent number: 5670379Abstract: A chromatograph system with improved automation is provided. In the chromatograph system of one embodiment, a regression line is set between retention times of predetermined peaks measured at each run in the past for a standard sample having known components. Referring to this regression line, the peak identifying condition, i.e., time window, is corrected. In another embodiment, there is provided a chromatograph apparatus having a function of estimating a limited life time of a system component. The analyzed results of the chromatograph system can thus be improved.Type: GrantFiled: January 13, 1995Date of Patent: September 23, 1997Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Masahito Ito, Junkichi Miura, Yoshio Fujii, Hiroshi Satake, Mitsuo Ito, Fuminori Umesato, deceased
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Patent number: 5471141Abstract: When image information obtained on the basis of an NMR signal, e.g. MRI, is acquired, a radio frequency pulse is set so that a strong signal can be obtained particularly from a portion of interest among the sample. To accomplish this object, the occurrence of signals from portions of the sample other than the selected portion of interest is inhibited in advance of obtaining information (an image) of the sample. Various radio frequency pulses are then irradiated to the sample and a suitable radio frequency pulse is determined on the basis of the resulting signal.Type: GrantFiled: January 20, 1995Date of Patent: November 28, 1995Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Makoto Yoshida, Naoki Satoh, Hidehiko Asoh, Tuyosi Shudo, Ryuzaburo Takeda, Jun'ichi Taguchi
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Patent number: 5458003Abstract: An electromagnetic flow meter comprises a ceramic measuring pipe formed into a straight cylinder through which fluid to be measured flows, electromagnetic field generating device disposed adjacent to a central portion of an outer surface of the central portion of the ceramic measuring pipe for generating an electromagnetic field into a radial direction of the ceramic measuring pipe, electrodes for detecting an electric potential generated in the fluid, a case which accommodates the ceramic measuring pipe, the electromagnetic field generating device and the electrodes, and sealing members which are disposed between inner surfaces of the flanges of the case and ends of outer circumference of the ceramic measuring pipe. The case has a length longer than that of the ceramic measuring pipe and flanges at both ends thereof. Inner diameters of the flanges are slightly larger than an outer diameter of the ceramic measuring pipe.Type: GrantFiled: November 30, 1992Date of Patent: October 17, 1995Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co, Ltd.Inventors: Tamio Ishihara, Yutaka Sakurai, Masao Fukunaga, Shigeo Nishino, Souzo Fujimoto
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Patent number: 5424550Abstract: A charged particle beam exposure apparatus includes an irradiator for irradiating a sample with a charged particle beam, an analog controller for analog controlling the charged particle beam, a digital controller for digital controlling the analog controller, and a digital transmission path connecting the analog controller to the digital controller. The analog controller is disposed inside a room, and the digital controller is disposed outside the room.Type: GrantFiled: January 21, 1994Date of Patent: June 13, 1995Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Masamichi Kawano, Masahide Okumura, Haruo Yoda, Yukinobu Shibata, Tadao Konishi
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Patent number: 5384466Abstract: The object of the invention is to provide an electron beam lithography apparatus and a method thereof which, while maintaining a predetermined pattern drawing accuracy, enables the pattern drawing speed to be improved still further. An electron beam lithography apparatus comprising exposing an electron beam 2 from an electron gun 1, interrupting the electron beam 2 by means of a blanker 6, further deflecting the electron beam 2 by applying a voltage to a deflector 7, wherein the electron beam lithography apparatus is characterized by selecting one of a first predetermined period of time required for the voltage of the deflector 7 to be stabilized and a second period of time which is shorter than the foregoing first period of time, and wherein the blanker 6 is operated according to the result of the foregoing selection.Type: GrantFiled: May 20, 1993Date of Patent: January 24, 1995Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Kazumitsu Nakamura, Rikio Tomiyoshi
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Patent number: 5378630Abstract: A test strip automatic supply device has: a cylindrical container 11 provided with a slit 15 which is formed in a side wall thereof so as to contain an elongate test strip; a container-supporting table having, in an upper portion thereof, a semi-cylindrical concave surface provided with an opening 20 which is formed in a middle portion of the concave surface so as to allow a test strip fitted in the slit of the container 11 to fall through and be taken out; and a carrying stage 31 which receives and transports a test strip falling from the slit 15. While the transporting stage 31 is transporting a test strip, an optical detector finds whether the test strip is faced up or down. The device has such a function that a side-reversing mechanism flips it over during transportation if it is face down. An operator only has to put test strips in the container. The tests strips are automatically let out of the container one at a time.Type: GrantFiled: November 10, 1992Date of Patent: January 3, 1995Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Susumu Kai, Isao Shindo, Shigeo Mutoh, Kasumi Yoshida
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Patent number: 5368727Abstract: A liquid chromatograph mass spectrometer includes a liquid chromatograph unit for performing liquid chromatography, an atomizer having a controllable temperature for heating and atomizing a liquid flowing out of the liquid chromatograph unit during liquid chromatography to produce an atomized liquid, an ionizing device for ionizing the atomized liquid to produce an ionizing sample, a mass spectrometer for analyzing the ionized sample, a storage device for successively storing liquid chromatography conditions and respective atomizer temperatures used for the liquid chromatography conditions for past measurements performed with the liquid chromatograph mass spectrometer, an input device for inputting a current liquid chromatography condition for a current measurement, a retrieving device for retrieving from the storage device a liquid chromatography condition nearest to the current liquid chromatography condition among the liquid chromatography conditions stored in the storage device, and the atomizer temperatuType: GrantFiled: September 29, 1992Date of Patent: November 29, 1994Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Toshiaki Takahashi, Kenichi Shizukuishi, Youko Katho, Naoto Senda, Tomomi Bando
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Patent number: 5309106Abstract: Apparatus for cancelling magnetic fields for cancelling a leakage magnetic field from a static magnetic field generation assembly are disposed outside the static magnetic field generation assembly. A magnetic shield made of a magnetic substance is disposed between the static magnetic field generating assembly and the cancelling magnetic field apparatus. The cancelling magnetic field generation apparatus is of a cryostatless type.Type: GrantFiled: October 23, 1992Date of Patent: May 3, 1994Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Goh Miyajima, Takao Takahashi, Takehiko Konno