Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal With respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.

Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal with respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.

Abstract: A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.

Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal with respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.

Abstract: Relationship among an exciting current of each lens of an irradiation lens system including at least two stages of irradiation lenses and an electron beam aperture, an irradiation electron beam density on a sample and an area of the sample surface irradiated with an electron beam is stored in a form of a table or equations, and an exciting condition of each of the lenses of the irradiation lens system is retrieved from the relationship and set the irradiation lens system to the retrieved condition, for example, when the enlarging magnification is changed under a condition of keeping the irradiation electron beam density at a constant value. Further, trails of a region of the sample surface irradiated with the electron beam is displayed on a display unit.

Abstract: A method of properly correcting a base line. A concept of flexibility of a base line is introduced as an input index and a gravitation is presumed between the base line and signal data which is measured, thereby constructing a method of correcting the base line which changes gentler than a change in signal with respect to time in a peak area and which is sensitive to an area where a value of the signal data is small. A base line like a natural and smooth curve which isn't easily influenced by a local change in signal such as noise or the like can be set by an input of the flexibility.

Abstract: An electron beam drawing process of high throughput, coping with the changes in static distortion and dynamic distortion of a lower layer exposure apparatus or an optical reduction exposure apparatus. At least two marks formed in each chip formed on a wafer are detected for a predetermined number of chips, and the relation between the shape distortion of each chip in the wafer plane and the wafer coordinates is determined from the positions of the detected marks and the designed positions of the marks by a statistical processing. Patterns are drawn in all chips while correcting the patterns to be drawn on the individual chips, by using the relation between the determined chip shape distortion and the wafer coordinates. As a result, the superposition exposure with the lower layer can be achieved with a high throughput and with a high accuracy without any manual adjustment.

Abstract: In an electron microscope employing an X-ray spectrometer according to the present invention, a collimator is provided in a head portion of the X-ray spectrometer and a part of the collimator is arranged in a leakage magnetic field of an objective lens included in the electron microscope, whereby the orbits of the scattering electrons are curved and hence the scattering electrons are prevented from colliding with the X-ray spectrometer to dissolve the background noises in the X-ray spectrum

Abstract: A body fluid sample and a reagent are reacted in a reaction container, and after measuring the reaction solution the reaction solution is discharged from the reaction container. The vacant reaction container is washed by charging a detergent solution containing plural kinds of surface active agents through a nozzle of a washing mechanism. The detergent solution is a mixed solution containing polyoxyethylene alkyl ether, polyoxyethylene polyoxypropylene glycol ether, N-acyl amino acid salt and polyacrylic salt. By the washing method in accordance with the present invention, it is possible to eliminate bad effects due to incomplete washing of reaction containers in an apparatus for automatically successively analyzing biological samples.

Abstract: A semiconductor memory device has memory cells provided at intersections between word line conductors and data line conductors. Each of the memory cells includes a cell selecting transistor and an information storage capacitor. The capacitor in each of the memory cells includes a first capacitor component formed over the control electrode of the transistor and a second capacitor component formed over a word line conductor which is adjacent to a word line conductor integral with the control electrode of the transistor. Each of the first and second capacitor components has a common electrode, a storage electrode and a dielectric film sandwiched therebetween, and the storage electrode is at a level higher than the common electrode in each of said first and second capacitor components. The storage electrodes of the first and second capacitor components are electrically connected with each other and with one of the semiconductor regions of the transistor.

Abstract: A chromatograph system with improved automation is provided. In the chromatograph system of one embodiment, a regression line is set between retention times of predetermined peaks measured at each run in the past for a standard sample having known components. Referring to this regression line, the peak identifying condition, i.e., time window, is corrected. In another embodiment, there is provided a chromatograph apparatus having a function of estimating a limited life time of a system component. The analyzed results of the chromatograph system can thus be improved.

Abstract: The object of the invention is to provide an electron beam lithography apparatus and a method thereof which, while maintaining a predetermined pattern drawing accuracy, enables the pattern drawing speed to be improved still further. An electron beam lithography apparatus comprising exposing an electron beam 2 from an electron gun 1, interrupting the electron beam 2 by means of a blanker 6, further deflecting the electron beam 2 by applying a voltage to a deflector 7, wherein the electron beam lithography apparatus is characterized by selecting one of a first predetermined period of time required for the voltage of the deflector 7 to be stabilized and a second period of time which is shorter than the foregoing first period of time, and wherein the blanker 6 is operated according to the result of the foregoing selection.

Abstract: A liquid chromatograph mass spectrometer includes a liquid chromatograph unit for performing liquid chromatography, an atomizer having a controllable temperature for heating and atomizing a liquid flowing out of the liquid chromatograph unit during liquid chromatography to produce an atomized liquid, an ionizing device for ionizing the atomized liquid to produce an ionizing sample, a mass spectrometer for analyzing the ionized sample, a storage device for successively storing liquid chromatography conditions and respective atomizer temperatures used for the liquid chromatography conditions for past measurements performed with the liquid chromatograph mass spectrometer, an input device for inputting a current liquid chromatography condition for a current measurement, a retrieving device for retrieving from the storage device a liquid chromatography condition nearest to the current liquid chromatography condition among the liquid chromatography conditions stored in the storage device, and the atomizer temperatu