Patents Assigned to Hitachi Instruments
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Patent number: 5424550Abstract: A charged particle beam exposure apparatus includes an irradiator for irradiating a sample with a charged particle beam, an analog controller for analog controlling the charged particle beam, a digital controller for digital controlling the analog controller, and a digital transmission path connecting the analog controller to the digital controller. The analog controller is disposed inside a room, and the digital controller is disposed outside the room.Type: GrantFiled: January 21, 1994Date of Patent: June 13, 1995Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Masamichi Kawano, Masahide Okumura, Haruo Yoda, Yukinobu Shibata, Tadao Konishi
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Patent number: 5384466Abstract: The object of the invention is to provide an electron beam lithography apparatus and a method thereof which, while maintaining a predetermined pattern drawing accuracy, enables the pattern drawing speed to be improved still further. An electron beam lithography apparatus comprising exposing an electron beam 2 from an electron gun 1, interrupting the electron beam 2 by means of a blanker 6, further deflecting the electron beam 2 by applying a voltage to a deflector 7, wherein the electron beam lithography apparatus is characterized by selecting one of a first predetermined period of time required for the voltage of the deflector 7 to be stabilized and a second period of time which is shorter than the foregoing first period of time, and wherein the blanker 6 is operated according to the result of the foregoing selection.Type: GrantFiled: May 20, 1993Date of Patent: January 24, 1995Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Kazumitsu Nakamura, Rikio Tomiyoshi
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Patent number: 5378630Abstract: A test strip automatic supply device has: a cylindrical container 11 provided with a slit 15 which is formed in a side wall thereof so as to contain an elongate test strip; a container-supporting table having, in an upper portion thereof, a semi-cylindrical concave surface provided with an opening 20 which is formed in a middle portion of the concave surface so as to allow a test strip fitted in the slit of the container 11 to fall through and be taken out; and a carrying stage 31 which receives and transports a test strip falling from the slit 15. While the transporting stage 31 is transporting a test strip, an optical detector finds whether the test strip is faced up or down. The device has such a function that a side-reversing mechanism flips it over during transportation if it is face down. An operator only has to put test strips in the container. The tests strips are automatically let out of the container one at a time.Type: GrantFiled: November 10, 1992Date of Patent: January 3, 1995Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Susumu Kai, Isao Shindo, Shigeo Mutoh, Kasumi Yoshida
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Patent number: 5368727Abstract: A liquid chromatograph mass spectrometer includes a liquid chromatograph unit for performing liquid chromatography, an atomizer having a controllable temperature for heating and atomizing a liquid flowing out of the liquid chromatograph unit during liquid chromatography to produce an atomized liquid, an ionizing device for ionizing the atomized liquid to produce an ionizing sample, a mass spectrometer for analyzing the ionized sample, a storage device for successively storing liquid chromatography conditions and respective atomizer temperatures used for the liquid chromatography conditions for past measurements performed with the liquid chromatograph mass spectrometer, an input device for inputting a current liquid chromatography condition for a current measurement, a retrieving device for retrieving from the storage device a liquid chromatography condition nearest to the current liquid chromatography condition among the liquid chromatography conditions stored in the storage device, and the atomizer temperatuType: GrantFiled: September 29, 1992Date of Patent: November 29, 1994Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co., Ltd.Inventors: Toshiaki Takahashi, Kenichi Shizukuishi, Youko Katho, Naoto Senda, Tomomi Bando
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Patent number: 5323110Abstract: In a magnetic resonance imaging system, object movement along an axis associated with readout magnetic gradient pulses is detected, quantized and compensated for in reconstructing an image slice. Phase-encoding magnetic gradient pulses in the sequence are arranged so that low-order phase-encoding pulses are distributed substantially uniformly during scanning time. In an N-slice acquisition, object movement is determined y arranging each of the N sets of phase-encoding gradient pulses comprising a multi-slice sequence such that at each scan time, at least one of the N sets contains a low-order phase-encoding gradient pulse. During data acquisition, echoes returned from low-order phase-encoding gradient pulses have sufficient signal-to-noise ratios to identify object position along the readout axis. Identification of object movement from one slice may be valid for other slices relatively adjacent physically in the object, so that all N slices are movement corrected during image reconstruction.Type: GrantFiled: August 10, 1992Date of Patent: June 21, 1994Assignee: Hitachi Instruments, Inc.Inventors: John Fielden, Li-Hsin Zang, Jacob Wilbrink
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Patent number: 5309106Abstract: Apparatus for cancelling magnetic fields for cancelling a leakage magnetic field from a static magnetic field generation assembly are disposed outside the static magnetic field generation assembly. A magnetic shield made of a magnetic substance is disposed between the static magnetic field generating assembly and the cancelling magnetic field apparatus. The cancelling magnetic field generation apparatus is of a cryostatless type.Type: GrantFiled: October 23, 1992Date of Patent: May 3, 1994Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Goh Miyajima, Takao Takahashi, Takehiko Konno
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Patent number: 5296669Abstract: A specimen to be irradiated with an electron beam is supported by a heating member secured detachably to a specimen holder and the heating member, a power supply therefor and electric conductive lines for conducting a electric power from the power supply to the heating member are integrated into the specimen holder.Type: GrantFiled: May 28, 1993Date of Patent: March 22, 1994Assignees: Hitachi, Ltd., Hitachi Instruments Engineering Co, Ltd.Inventors: Hiroyuki Kobayashi, Takeo Kamino, Masahiro Tomita
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Patent number: 5281827Abstract: A column section is disposed within a thermostatic chamber within a clean room, a section for analog controlling each portion of the column section is disposed within the clean room and outside of the thermostatic chamber, and a section for digital controlling the analog control section is disposed outside of the clean room.Type: GrantFiled: September 20, 1991Date of Patent: January 25, 1994Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Masamichi Kawano, Masahide Okumura, Haruo Yoda, Yukinobu Shibata, Tadao Konishi
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Patent number: 5278407Abstract: A secondary-ion mass spectrometry apparatus using a field limiting method includes an optical system for primary ions, a sample chamber, and an optical system for secondary ions, and a total ion monitor (TIM) interposed between an electric sector and a magnetic sector of the optical system for secondary ions. A field-limited image (or TIM image) from the TIM can be observed or monitored continually by a CRT, thereby making it possible to grasp quantitatively the charging state of a sample surface. The apparatus may further include an adjuster for adjusting quantatively the charging state of the sample surface.Type: GrantFiled: April 24, 1992Date of Patent: January 11, 1994Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Yoshinori Ikebe, Hifumi Tamura, Hiroyuki Sumiya, Akemi Furuki
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Patent number: 5276499Abstract: A spectrophotometer which takes out monochromatic lights from lights from light sources by using spectroscopes and transmits the monochromatic lights through a sample and detects the transmitted lights by sensors includes a plurality of dispersing elements in the spectroscope which bear the dispersion of different wavelength ranges or a plurality of sensors which bear the detection of different wavelength ranges in order to widen a measurement wavelength range; and means for correcting the difference between measured values obtained when the different dispersing elements were used or the difference between measured values obtained when the different sensors were used at one wavelength in overlap wavelength regions between different wavelength ranges so as to be set to zero.Type: GrantFiled: October 2, 1990Date of Patent: January 4, 1994Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Sadao Minakawa, Masaru Enomoto, Masaya Kojima
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Patent number: 5270212Abstract: This invention relates to an apparatus for analyzing cells in a biological liquid sample, such as blood, in which apparatus a flow passage in a sample pretreatment system can be shortened with a simple construction. A sample metering chamber, a mixing chamber and a measurement liquid extracting chamber are formed in a rotary sliding member of a pretreatment portion. The rotary sliding member is intermittently rotated so as to shift a sample from one chamber to another to perform a necessary treatment. Fluorescence or scattering light with respect to the sample, mixed with a reagent in the pretreatment portion, is detected by a flow cell.Type: GrantFiled: February 26, 1992Date of Patent: December 14, 1993Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Hideyuki Horiuchi, Shinichi Sakuraba, Toshio Kaneko, Nobuyuki Tatara, Ryohei Yabe, Hiroshi Ohki, Isao Yamazaki, Ryo Miyake
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Patent number: 5236847Abstract: A method for analyzing amino acids in biological liquids wherein a buffer liquid including unknown components to be analyzed is introduced to a separation column for separating amino acids. After reaction of the buffer liquid in a reactor, the amino acids are detected by a photometer. The flow rate of the buffer liquid is maintained at a predetermined value until the asparagine, glutamine acid and glutamine are separated from the separation column and the flow rate of the buffer liquid is varied stepwise or in linear gradient after separation of the above three components from the separation column.Type: GrantFiled: November 26, 1991Date of Patent: August 17, 1993Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Hiroshi Satake, Yoshio Fujii, Kohta Kimiyoshi
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Patent number: 5206517Abstract: An electron beam lithographic method in which a sample is irradiated with an electron beam, wherein an extreme point of a contour of a pattern is calculated and a lithographic area is divided into a first region that is surrounded by straight lines drawn from the extreme point in parallel with the x-axis and the y-axis of the sample and by said pattern, and second regions in order to be lithographed.Type: GrantFiled: November 27, 1991Date of Patent: April 27, 1993Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Yukinobu Shibata, Ikuo Takada, Akira Hirakawa, Tadao Konishi
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Patent number: 5185523Abstract: A mass spectrometer for analyzing ultra trace element using plasma ion source comprising, a plasma generating means for ionizing sampling gas by generating plasma, a vaccum chamber for taking in ions of the sampling gas from a hole of the vacuum chamber, an ion lens and a mass analyzing portion, and an ion detector for detecting the ions which are passed through the ion lens and the mass analyzing portion, wherein further comprising, a moving mechanism for moving said plasma generating means according to a vacuum degree measured in the vacuum chamber so as to make the sensitivity of the mass spectrometer higher.Type: GrantFiled: March 10, 1992Date of Patent: February 9, 1993Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Masatoshi Kitagawa, Yukio Okamoto, Takayuki Ono, Tetuya Shinden
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Patent number: 5101157Abstract: When the center of an object of interest imaged and the center of a display screen or image area deviate from each other, a Fourier transformation imaging method includes (a) a step of representing the amount of deviation of those centers from each other by the amount of deviation in a frequency encoding direction and the amount of deviation in a phase encoding direction, (b) a step of converting each of the amounts of deviation in the frequency and phase encoding directions into a value calculated in terms of the amount of rotation of the phase angle of a measured resonance signal, (c) a step of correcting the amount of rotation of the phase angle of the measured resonance signal on the basis of the values obtained by the conversion, and (d) a step of Fourier-transforming the corrected signal to display an image in which there is no deviation or the center of the object of interest is located at the center of the image area.Type: GrantFiled: March 8, 1990Date of Patent: March 31, 1992Assignees: Hitachi, Ltd., Hitachi Instrument Eng. Co.Inventors: Mitsunobu Nagashima, Ryuzaburo Takeda
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Patent number: 5086227Abstract: A secondary ion mass analyzing apparatus is suitable for a depth directional analysis of a specimen. The apparatus includes means for forming an image of said secondary ions, an aperture disposed on a position in which the secondary ion image is formed, means for detecting the secondary ions which have passed through the aperture and for converting the detected ions into electrical signals, and means for displaying an image of said aperture based on the electrical signals. In such a manner, the aperture is disposed on the secondary ion image forming position. The image of the aperture is displayed on the image displaying apparatus by using the secondary ions which have passed through the aperture. If the ion image is not formed on the position of the aperture, the contour of the aperture image would be unclear while if the ion image is formed on the position of the aperture, the contour of the aperture image would be clear.Type: GrantFiled: October 18, 1990Date of Patent: February 4, 1992Assignees: Hitachi, Ltd., Hitachi Instrument Eng. Co., Ltd.Inventors: Hiroshi Toita, Hiroshi Hirose, Hifumi Tamura
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Patent number: 5047647Abstract: An electron beam lithography apparatus comprising an electron lens, a deflector, a reflective electron detector of marks on a stage or a specimen thereon when the deflector scans the marks, and a means for memorizing high order polynomial equations and calculating a correcting value of the deflector controlling means based on the high order polynomial equations, wherein all coefficients of the high order polynomial equation are calculated when the electron beam lithography apparatus starts up, and after then, coefficient of the first order term is calculated from the position signals of the marks frequently in a short cycle.Type: GrantFiled: September 14, 1990Date of Patent: September 10, 1991Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co.Inventors: Hiroyuki Itoh, Kenichi Hirane
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Composite apparatus with secondary ion mass spectrometry instrument and scanning electron microscope
Patent number: 5008537Abstract: A composite apparatus is disclosed which includes in combination a secondary ion mass spectrometry instrument and a scanning electron microscope. A liquid metal ion source and an ion source other than the liquid metal ion source are installed in the same apparatus so that an ion beam emitted from the liquid metal ion source and an ion beam emitted from the ion source other than the liquid metal ion source are aligned with each other on a primary beam axis which is an optical axis of an irradiating system. The liquid metal ion source is disposed in rear of a primary ion separating device which mass-separates the ion beam emitted from the ion source other than the liquid metal ion source. Further, an electron gun is installed in the same apparatus so that an electron beam emitted from the electron gun is aligned with the ion beam on the primary beam axis.Type: GrantFiled: September 20, 1989Date of Patent: April 16, 1991Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Hiroshi Toita, Hifumi Tamura, Issei Tobita, Hiroshi Iwamoto -
Patent number: 4992661Abstract: A method of neutralizing an accumulated charge on a surface of a specimen which is examined in a scanning electron microscope (SEM) or a scanning ion microprobe mass analyzer (IMA), utilizes an electrically conductive thin film deposited on a part of the specimen surface. The charge is due to irradiation by a primary charged particle beam from the SEM or IMA. The thin film is made conductivity with a specimen mount mounting the specimen, and the irradiating range of the primary beam covers at least a part of the thin film. Thus, the accumulated charge can be neutralized, thereby a resolution of the SEM being improved due to applying higher accelerating voltage for the primary beam, and measured data of higher reliability being obtained in the IMA.Type: GrantFiled: August 17, 1988Date of Patent: February 12, 1991Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Hifumi Tamura, Yoshinori Ikebe, Katsuhiko Muroyama, Hiroyuki Sumiya
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Patent number: 4939365Abstract: A transmission electron microscope for irradiating a specimen with an electron beam, wherein the electron beam passed through the specimen is imaged on an imaging screen by a magnifying lens system. The electron microscope includes a deflector for deflecting the electron beam to thereby scan a specimen with the electron beam, and a memory for storing a range within which the specimen is to be preliminarily scanned with the electron beams and the number of scans to be performed. The specimen is preliminarily scanned with the electron beam within the preliminary scan range for the number of times on the basis of the corresponding data read out from the memory.Type: GrantFiled: August 30, 1988Date of Patent: July 3, 1990Assignees: Hitachi, Ltd., Hitachi Instrument Engineering Co., Ltd.Inventors: Hiroyuki Kobayashi, Teruo Suzuki, Akio Mori, Sadahiko Okamura, Shoji Kamimura