Patents Assigned to Hitachi Ltd. et al.
  • Mask having a phase shifter and method of manufacturing same
    Patent number: 5362591
    Abstract: There is disclosed a mask which includes a first phase shifter layer and a second phase shifter layer formed on the first phase shifter layer and has a structure capable of easily effecting highly precise control of the phase of exposure light and correction for a defect in the phase shifter layers. There are also disclosed a method of manufacturing the mask and a method of forming by use of the mask a pattern which has a smaller local error in pattern dimension and is free of a defect.
    Type: Grant
    Filed: October 5, 1990
    Date of Patent: November 8, 1994
    Assignee: Hitachi Ltd. et al.
    Inventors: Akira Imai, Norio Hasegawa, Hiroshi Fukuda, Toshihiko Tanaka