Patents Assigned to Hitachi, Ltd. Hitachi Cabel
  • Optical waveguide having a silicon oxi-nitride layer
    Patent number: 4737015
    Abstract: An optical waveguide comprising a layer formed on a substrate, having a mixed composition of silicon oxide and silicon nitride and having an arbitrary value of refractive index ranging between those of the silicon oxide and the silicon nitride. The layer of said mixed composition can be formed on the substrate to easily fabricate the optical waveguide of the present invention by conducting a sputtering method employing a Si target and controlling the composition of a sputtering gas composed of a mixture of N.sub.2 and O.sub.2 gases.
    Type: Grant
    Filed: November 26, 1984
    Date of Patent: April 12, 1988
    Assignee: Hitachi, Ltd. Hitachi Cabel
    Inventors: Koji Ishida, Hiroyoshi Matsumura, Kenji Hiruma, Kazuyuki Nagatsuma, Akihito Hongo