Patents Assigned to Hitachi Science Systems, Ltd.
  • Patent number: 7995833
    Abstract: An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: August 9, 2011
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems Ltd.
    Inventors: Takehiko Konno, Hiroshi Miyai
  • Patent number: 7788108
    Abstract: A period required for a time-consuming cross-contamination test is cut down or omitted, and a burden imposed on the customer by the costs of samples, reagents, etc. used in the test are reduced. A data failure caused by cross-contamination can be efficiently prevented. A maintenance service office establishes a connection via a communication line between a computer installed in the maintenance service office for maintenance of automatic analyzers and a customer's automatic analyzer or a personal computer placed in a customer's facility. The maintenance service office receives information regarding cross-contamination from reagent manufacturers and other customers (such as clinical examination rooms or centers) and validates it. The validated information is transmitted from the maintenance service office to the customer's automatic analyzer or personal computer via the communication line.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: August 31, 2010
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Takahiro Kikuchi, Masami Hayashi, Tomonori Mimura, Mitsuo Hattori, Takeshi Sato
  • Patent number: 7727469
    Abstract: In an automatic analyzer, when a sample is newly added, all sample barcodes on a sample disk are read. Immediately before dispensing it, second time reading is performed, and the result thereof is checked against that of the first time reading. A sample hand-contact preventing plate is provided above the reading position and dispensing position in order to prevent the sample from being exchanged after the second time reading. This hand-contact preventing plate has a damage-preventing configuration to protect a hand and fingers of an operator against a sampling probe.
    Type: Grant
    Filed: April 13, 2004
    Date of Patent: June 1, 2010
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Katsuaki Takahashi, Hiroshi Ohga, Masaharu Nishida
  • Patent number: 7625524
    Abstract: A highly-reliable, inexpensive and small-sized automatic analyzer is provided which can eliminate the need of an additional space for piercing a seal of a reagent bottle and can prevent a deviation of a reagent sampling nozzle from the position of a pierced hole. A piercing tool for piercing the seal of the reagent bottle is fitted over a nozzle of a reagent sampling mechanism, and a stripper for automatically fitting and removing the piercing tool is provided. By fitting the piercing tool for piercing the seal of the reagent bottle over the nozzle of the reagent sampling mechanism, the seal of the reagent bottle can be pierced in situ on a reagent disk by using the piercing tool. An additional space so far required for the seal piercing is no longer needed and a deviation between the seal piercing position and the reagent sampling position is prevented.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: December 1, 2009
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Tetsuya Isobe, Katsuaki Takahashi, Isao Yamazaki
  • Patent number: 7547414
    Abstract: For installing reagent bottles in a reagent disk, the operator needs to install them while confirming the orientation of each reagent bottle. However, the operator will groan under a psychological burden in working while confirming the orientation. If the operator installs a reagent cassette in wrong orientation, the result of measurement will be erroneous, possibly leading to a grave testing error particularly in a blood analyzer. An automatic analyzer comprises a recording medium for recording information on placement of a plurality of types of reagents contained in a single reagent container, a reagent container disk capable of carrying a plurality of the reagent containers, an information reader for reading information recorded on the recording medium, and a reagent dispense controller for controlling which of reagents is dispensed by a reagent dispenser based on the information read by medium information reader.
    Type: Grant
    Filed: July 26, 2004
    Date of Patent: June 16, 2009
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Masaharu Nishida, Hiroshi Ohga
  • Patent number: 7521695
    Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: April 21, 2009
    Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd.
    Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryulchirou Tamochi, Yayol Hosoya, Hidetoshi Morokuma
  • Patent number: 7511271
    Abstract: A scanning electron microscope includes an irradiation optical system for irradiating an electron beam to a sample; a sample holder for supporting the sample, arranged inside a sample chamber; at least one electric field supply electrode arranged around the sample holder; and an ion current detection electrode.
    Type: Grant
    Filed: September 21, 2005
    Date of Patent: March 31, 2009
    Assignee: Hitachi Science Systems, Ltd.
    Inventors: Michio Hatano, Sukehiro Ito, Shinichi Tomita, Junichi Katane
  • Patent number: 7364698
    Abstract: Without causing an increase in size and complication of an automatic analyzer, the efficiency of washing cuvettes can be increased and the amount of detergent used can be more effectively saved in comparison with known analyzers. In an automatic analyzer in which a sample and a reagent are dispensed into each of a plurality of cuvettes, a resulting reaction solution is mixed under stirring, and reaction states of the mixed reaction solution are measured successively. The automatic analyzer includes a unit for stirring a detergent in the cuvette when the interior of the cuvette is washed with the detergent after measurement of a reaction. The automatic analyzer also includes a control device controlling steps of reaction measurement and washing and incorporating a sequence of stirring in the washing step. A mixing unit for mixing the reaction solution also serves as the unit for stirring the detergent in the cuvette.
    Type: Grant
    Filed: January 14, 2004
    Date of Patent: April 29, 2008
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Takehiro Fujita, Katsuaki Takahashi, Masaharu Nishida
  • Publication number: 20080042061
    Abstract: An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.
    Type: Application
    Filed: October 12, 2007
    Publication date: February 21, 2008
    Applicants: HITACHI HIGH-TECHNOLOGIES CORPORATION, HITACHI SCIENCE SYSTEMS, LTD.
    Inventors: Takehiko Konno, Hiroshi Miyai
  • Patent number: 7294833
    Abstract: An inspection system includes a SEM visual inspection apparatus for detecting a defect in a semiconductor sample in steps of manufacturing a semiconductor device and a review apparatus for observing, at a high resolution, the defect in the semiconductor sample detected by the SEM visual inspection apparatus. The system has a function of transmitting an alignment dictionary image as one of alignment parameters to be set by the SEM visual inspection apparatus using an inspection recipe to the review apparatus.
    Type: Grant
    Filed: May 19, 2004
    Date of Patent: November 13, 2007
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems Ltd.
    Inventors: Takehiko Konno, Hiroshi Miyai
  • Patent number: 7274017
    Abstract: Disclosed is an electron beam apparatus and method which can retain the state that minimizes the amount of water content contained at a gap between a high-voltage cable and a high-voltage introduction insulator to thereby prevent creation of high-voltage discharge and current leakage. The apparatus comprises a means for applying a high voltage to an acceleration electrode while eliminating electron release from an electron source and for detecting a change in an emission current corresponding to a change in an acceleration voltage at this time. In addition, the apparatus comprises a means for issuing a cautionary notice or warning when the change of this emission current exceeds a prespecified value. Further, the apparatus comprises a means for letting a dry gas flow in a gap portion between the electron gun's high-voltage cable and the high-voltage introduction insulator to thereby dehumidify said gap portion.
    Type: Grant
    Filed: May 26, 2005
    Date of Patent: September 25, 2007
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Akimitsu Okura, Masashi Kimura, Kenichi Hirane, Yoshihiko Nakayama
  • Patent number: 7217925
    Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.
    Type: Grant
    Filed: December 22, 2005
    Date of Patent: May 15, 2007
    Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd.
    Inventors: Yoshinori Nakada, Shunsuke Koshihara, Ryuichirou Tamochi, Yayoi Hosoya, Hidetoshi Morokuma
  • Patent number: 7214938
    Abstract: Preparations are made for the transmission image of an object tilted as a reference image and the image obtained by polar coordinate conversion of this transmission image, and correlation is established with the image obtained by polar coordinate conversion of the transmission image of the object in a sample.
    Type: Grant
    Filed: September 19, 2005
    Date of Patent: May 8, 2007
    Assignees: Hitachi Science Systems, Ltd., Hitachi High-Technologies Corp.
    Inventors: Eiko Nakazawa, Isao Nagaoki
  • Patent number: 7179000
    Abstract: The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: February 20, 2007
    Assignee: Hitachi Science Systems, Ltd.
    Inventors: Hisayuki Takasu, Kouichi Miyazawa, Toru Iwaya
  • Patent number: 7163379
    Abstract: A gradient liquid feed pump system capable of liquid feed in a correct mixing ratio even in the case of liquid feed in which the mixing ratio varies. Specifically, it comprises a first plunger pump for sucking and delivering an eluate, a second the first and second plunger pumps through a cam, a first pressure sensor for measuring the pressure in the flow path of the second plunger pump, a second pressure sensor for measuring the pressure in the fist plunger pump, a cam position detecting sensor for detecting the cam position, wherein when the cam position is in a delivery interval, the rotary speed of the motor is increased, and the period for decreasing the rotary speed is determined on the basis of the difference between the pressure values obtained from the first and second pressure sensors, respectively. Thereby, liquid feed can be smoothly effected with correct mixing ratio while avoiding pressure interference between pumps.
    Type: Grant
    Filed: March 17, 2003
    Date of Patent: January 16, 2007
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Kiyotoshi Mori, Kenichiro Takahashi, Masanori Takaki, Masato Fukuda, Masahito Ito, Hironori Kaji
  • Patent number: 7154089
    Abstract: A scanning electron microscope in which the secondary electrons generated from a specimen are efficiently caught by a secondary electron detector by correcting and controlling the trajectory of the secondary electrons is disclosed. A first auxiliary electrode impressed with a negative potential of several to several tens of volts is arranged in the vicinity of a radiation hole of the primary electron beam under an objective lens, and a second auxiliary electrode impressed with a positive voltage is arranged on the side of the first auxiliary electrode nearer to the secondary electron detector thereby to correct and control the trajectory of the secondary electrons. Further, a third auxiliary electrode for assisting in catching the secondary electrons generated from the specimen is arranged on the front surface of the secondary electron detector.
    Type: Grant
    Filed: December 8, 2004
    Date of Patent: December 26, 2006
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Junichi Katane, Sukehiro Ito
  • Patent number: 7146872
    Abstract: Provision of a 3-DOF micro manipulator easy to operate and capable of executing accurate positioning, wherein the link mechanisms of the micro manipulator whose main operation is parallel 3-DOF operation are implemented by cutting, folding, and moding a sheet of metal plate. Base and end effector are connected by three link mechanisms. The three link mechanisms are manufactured by cutting and folding a flexible plate material, and are equipped with plate-like arm portions each having a spread in the axially peripheral direction of the end effector, with hinge portions that are formed longitudinally across each arm portion in order to function as revolving joints R, and with a hinge portion also formed at the middle position of the arm portion in order to function as revolving joints R. Also, a parallelogrammatic link is formed between one longitudinal end of the arm portion and the middle portion thereof in order to function as a prismatic joint pair P.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: December 12, 2006
    Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd., National Institute of Advanced Industrial Science and Technology
    Inventors: Kazuhiro Morita, Motohide Ukiana, Kazuhiro Fujii, Shigeto Isakozawa, Hidemi Koike, Tamio Tanikawa
  • Patent number: 7081625
    Abstract: The object of the present invention is to transmit the position information of a defect that has been specified by means of a circuit pattern inspection apparatus quickly and precisely so that the position information is efficiently used in another apparatus. Marking is carried out on the peripheral area of the defect by use of a charged particle beam irradiation mechanism of the inspection apparatus. The marking realizes sharing of the defect position information with another apparatus. The marking technique includes deposition of a deposit and charging up by means of irradiation of a charged particle beam. The marking in the inspection apparatus allows the defect position information to be transmitted to another apparatus more correctly and easily, and as a result, analysis accuracy is improved and analysis time is shortened.
    Type: Grant
    Filed: November 5, 2003
    Date of Patent: July 25, 2006
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Masanari Furiki, Kouichi Kurosawa, Takehiko Konno, Ryuichi Funatsu
  • Patent number: 7053371
    Abstract: A scanning electron microscope which efficiently makes measurements for plural measurement items at a time and allows easy entry, confirmation and revision of auto measurement parameters. Parameters for creation of a line profile from an image captured by the scanning electron microscope are entered as auto measurement parameters (AMP) to be used as common conditions for all measurement items. Also, plural combinations of edge detection methods and measurement calculation methods are entered as auto measurement parameters to make measurements for plural items.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: May 30, 2006
    Assignees: Hitachi High-Technologies Corporation, Hitachi Science Systems, Ltd.
    Inventors: Yuuki Ojima, Katsuhiro Sasada, Kazuhiro Ueda, Tsuyoshi Morimoto
  • Patent number: 7041977
    Abstract: An object of the present invention is to provide an electron microscope that is capable of improving work efficiency when restarting sample observation. A control unit for controlling observation-condition setting devices, which include an electron-gun control unit, an irradiation-lens control unit, an objective-lens control unit, a magnifying-lens-system control unit, and a sample-stage control unit, is provided. When image data of a certain sample is specified, observation condition data of the sample is retrieved. Then, observation conditions, which are the same as those used when the image data of the sample has been saved, are automatically restored on an electron microscope on the basis of the observation condition data. As a result, an image, which is the same as the stored image, is restored faithfully.
    Type: Grant
    Filed: February 8, 2005
    Date of Patent: May 9, 2006
    Assignees: Hitachi, Ltd., Hitachi Science Systems, Ltd.
    Inventors: Eiko Nakazawa, Isao Nagaoki