Patents Assigned to Hitichi, Ltd.
  • Publication number: 20140189416
    Abstract: A calculation device is provided that executes calculations within real-time restrictions. The calculation device implements a step of predicting a processing time of a calculation related to the amount and property of input data based on a prediction model; a step of adjusting the processing time by decreasing the amount of data used for the calculation or decreasing the number of iterative calculations when the processing time exceeds a time slice allocated to the calculation; a step of executes the calculation using the adjusted processing time; a step of updating, as required, the prediction model used for predicting the processing time according to the result of the calculation which is executed in a period where the calculation is not performed while implementing a change of the amount of data or the number of iterative calculations or change to an approximation.
    Type: Application
    Filed: August 26, 2011
    Publication date: July 3, 2014
    Applicant: Hitichi, Ltd.
    Inventors: Yoshiyuki Tajima, Koichiro Iijima, Tohru Watanabe, Takaharu Ishida
  • Publication number: 20020023486
    Abstract: Resin members, on the surfaces of which metal films are formed, are used for; an auxiliary air passage provided in a main air passage, in which a sensor element of a physical quantity sensor such as an air flow sensor, an intake-air temperature sensor, etc., is situated; a housing; and so forth; in order to decrease both the thermal conductivity and the emissivity of those components to respective small values, whereby the temperature increase of the sensor due to both the heat conduction and the heat radiation can be suppressed.
    Type: Application
    Filed: February 23, 2001
    Publication date: February 28, 2002
    Applicant: HITICHI, LTD.
    Inventors: Izumi Watanabe, Naoki Saito, Masayuki Kozawa, Keiichi Nakada, Kei Ueyama
  • Patent number: 5328807
    Abstract: A comb-like or dot-like phase shifter pattern is added to a phase shifter used in phase shifting mask technology, which is then exposed onto a wafer. This enables the formation of extremely fine line patterns or space patterns having widths different from each other simultaneously. Further, when two reticles are disposed such that phase shifter patterns disposed therein intersect each other and are exposed consecutively onto a wafer, a fine hole pattern or dot pattern can be formed at a position where the phase shifter patterns intersect each other.
    Type: Grant
    Filed: June 7, 1991
    Date of Patent: July 12, 1994
    Assignee: Hitichi, Ltd.
    Inventors: Toshihiko Tanaka, Norio Hasegawa, Toshiaki Yamanaka, Akira Imai, Hiroshi Shiraishi, Takumi Ueno, Hiroshi Fukuda