Patents Assigned to Holtek Microelectonics, Inc.
  • Modified zero layer align method of twin well MOS fabrication
    Patent number: 5866447
    Abstract: A method for fabricating alignment marks in a twin-well integrated circuit without using a zero-layer photomask is disclosed.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: February 2, 1999
    Assignee: Holtek Microelectonics, Inc.
    Inventor: Chia Chen Liu