Abstract: The present invention relates to a method and an apparatus for holographically recording periodic or quasi-periodic features of a mask in a holographic recording layer. In holographic lithography the object beam is directed to the first substrate bearing a holographic recording layer such that it passes the mask substrate and interferes with a reference beam in the recording layer to form a hologram of the mask pattern. According to the new method the object beam is directed to the second substrate at an off-axis angle and the wavelength used and/or the angle of incidence of the object beam are selected according to the period of the features to be recorded such that essentially just the zero and one of the first diffraction orders are present for forming the hologram.

Abstract: An apparatus is disclosed for changing the scale of a pattern printed from a total internal reflection hologram into a photosensitive layer, which apparatus includes means for reconstructing an image from said total internal reflection hologram by illuminating said total internal reflection hologram with a scanning beam and means for moving at least one of the hologram and photosensitive layer such that the magnitude of movement of the hologram relative to the photosensitive layer is equal to that of the scanning beam multiplied by the change of scale required and such that if said change of scale is a magnification the direction of said movement of the hologram relative to the photosensitive layer is the same as that of the scanning beam whereas if said change of scale is a demagnification then the direction of said movement of the hologram relative to the photosensitive layer is opposite to that of the scanning beam, and optionally comprising also means for increasing or reducing the convergence or divergen

Abstract: A method for the manufacture of TIR holograms includes the division of an input laser beam into an object beam and a reference beam, the direction of the beams to a holographic recording layer so that the object beam is incident on a surface of the holographic recording layer following transmission through an object mask, so that the reference beam is incident on the other surface of the holographic recording layer at an angle such that following passage through the holographic recording layer it is totally internally reflected back into the holographic recording layer and so that the two beams are superposed at the holographic recording layer, and the displacement of the input laser beam causing the object and reference beams to traverse together the holographic recording layer. The method is especially useful for obtaining a high uniformity of exposure of the holographic recording layer.

Abstract: Apparatus for transverse position measurement in a proximity lithographic system including a prism (10) having a glass plate (14) index matched beneath the prism on which a T.I.R. hologram (13) is pre-recorded. A laser source (12) provides a replay beam. A silicon wafer (16) is situated below the hologram and parallel therewith. A second laser source (17) produces through optics (18) a beam with gaussian intensity profile to generate a collimated strip of light (19) at the hologram plane. Elemental grating structures (20) are provided at different locations over the surface of the wafer. Detectors (22,24) collect parts of the lightfield resulting from the interaction of the laser beam with the grating structures. A piezo device (26) operated from a micro-processor (28) moves the silicon wafer in small increments in a direction substantially parallel to the hologram following measurements made by the two detectors which are processed by the micro-processor to produce an alignment signal for the piezo device.