Abstract: In some aspects of the invention, a system for operating a plurality of plasma and/or induction heating processing systems includes an operating unit that has a display device on which a graphic user interface can be displayed, at least two power generators that supply power to a plasma process or an induction heating process, and a network that connects the operating unit to the power generators to transmit signals between the operating unit and the power generators. The graphic user interface includes a static region and a dynamic region, and a selection device for selecting information to be displayed in the dynamic region.

Abstract: An RF power supply, in particular a plasma supply device, for generating an output power greater than 500 W at an output frequency of at least 3 MHz includes at least one inverter connectable to a DC power supply, which inverter comprises at least one switching element and an output network. An accompanying line connects an electrical component to the inverter by a lead-in of the output network.

Abstract: Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.

Abstract: A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.

Abstract: A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.

Abstract: To detect arc discharges occurring in a plasma, a parameter of the plasma process is determined, and after a first period of time following the detection of an arc discharge the parameter is again determined. In the event that after the first period of time no arc discharge is detected, a first arc suppression countermeasure for suppression of arc discharges is executed.

Abstract: An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator configured to emit an arc discharge detection signal and receive an instantaneous value of the signal or a signal proportional thereto, a minimum or maximum value detection device configured to receive the signal and to determine a minimum or maximum value of the signal within a predetermined time period, a setting means configured to receive the minimum or maximum value and to generate a reference signal from the minimum or maximum value, such that the reference signal is supplied to the comparator, and such that the comparator changes the signal level of the arc discharge detection signal when the comparator detects that the instantaneous value has reached the reference signal.

Abstract: A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps: a. carrying out an arc detection for at least one of the power supplies; b. generating at least one signal relating to the arc detection and/or data relating to the arc detection; transferring the at least one signal and/or the data to a plasma process-regulating device and/or to one or more other power supplies or to one or more of the arc diverter devices associated with the other power supplies.

Abstract: An arc suppression arrangement suppresses arcs in a gas discharge device that is operated with an alternating voltage from a power supply. The arc suppression arrangement includes an arc suppression device and an arc identification device that controls the arc suppression device. The arc suppression device includes at least one controllable resistor that is connected in series in an electrical line that extends from an alternating voltage source to an electrode of the gas discharge device. An arc can thereby be prevented from being provided with energy.

Abstract: In order to determine amplitudes of measurement signals originating from an AC power supply and to determine the phase shift (ø) between measurement signals more simply, the measurement signals are processed in measurement signal operation devices to form auxiliary signals each having a constant AC amplitude and to obtain first measurement values (v, a, rssi, rssi1, rssi2), in particular, from amplification factors (v) that are applied to the measurement signal (m, m1, m2). The phase shift between two auxiliary signals (h, h?, h?1, h?2) is further determined as a second measurement value, in particular, by means of the time difference (?t) between the zero passages of the auxiliary signals (h, h?, h?1, h?2).

Abstract: An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator to which an instantaneous signal and a reference value are supplied. The reference value is formed by a setting means from an extreme value of the signal. The extreme value is determined by an extreme value detection device within a predetermined time period, and the comparator changes the state of an arc discharge detection signal when the comparison between the reference value and an instantaneous value of the signal shows that an arc discharge has occurred.

Abstract: An arc discharge in a plasma process is detected using a method that includes detecting arc discharges by monitoring one or more characteristic values of the plasma process, and comparing at least a first characteristic value with a predefinable first threshold value (SW1). When it is determined that the at least first characteristic value reaches the first threshold value, a potential arc discharge is recognized and a first countermeasure is triggered to suppress the arc discharge. The method includes comparing at least a second characteristic value with a pre-definable second threshold value (SW2) that differs from the first threshold value, and when it is determined that the second characteristic value reaches the second threshold value, triggering a second countermeasure for suppressing the arc discharge. After the second countermeasure has been triggered, a renewed triggering of the second countermeasure is prevented during a blocking time (Tt).

Abstract: Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

Abstract: For suppressing arc discharges in a plasma process, a method includes monitoring of at least one parameter of the plasma process, determining a temporal feature of a first countermeasure and performing the first countermeasure. The temporal feature is determined as a function of, for example, at least one of an interval in time from at least one previous countermeasure, a development of the at least one parameter since a relevant time of introduction of the countermeasure, or since a variable period of time ahead of the relevant time of introduction of the countermeasure, and a differentiation as to whether a previous countermeasure was triggered based on the behavior of the at least one parameter, or based on the interval in time from at least one previous countermeasure.

Abstract: A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process.

Abstract: A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.

Abstract: A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.

Abstract: In an impedance matching circuit selectively operable in a normal matching mode and a protection mode, the impedance matching circuit includes a set of reactances in a first reactance arrangement configured to transform an impedance of a load to an impedance within a range of a nominal impedance of an HF generator in the normal matching mode, and a PIN diode switch having a first invariable switching state in the normal matching mode and a second switchomg state that reconfigures the set of reactances into a second reactance arrangement in the protection mode, such that the second reactance arrangement is configured to transform the impedance of the load to prevent damage to the HF generator or to transmission circuitry arranged between the HF generator and the load.

Abstract: A full bridge that produces an alternating output signal can be driven by operating switching elements of the full bridge in each period in a switching sequence that determines the order of the activation and deactivation of the switching elements. The switching elements are switched in at least two different switching sequences, a first switching sequence is repeated n times before a second switching sequence is carried out, with n>1, or the switching elements are switched in at least three different switching sequences.

Abstract: An excitation system for heating food, water, or both in airplanes uses induction heating. The system includes at least one load circuit including an inductor that is excited with a load circuit AC voltage, a load circuit alternating current, or both the load circuit AC voltage and the load circuit alternating current. The load circuit AC voltage, the load circuit alternating current, or both the load circuit AC voltage and the load circuit alternating current are generated from an AC voltage signal that is amplitude-modulated with a frequency of a mains AC voltage from a voltage supply. The frequency of the AC voltage signal can be predetermined.