Patents Assigned to Hugle Lithography
  • Lens array photolithography
    Patent number: 6016185
    Abstract: An apparatus and method for photolithographic exposure of a substrate including an illumination source for providing light for producing an image on the substrate, a mask including a pattern for projection onto the substrate, a lens assembly for projecting the light through a plurality of lens channels onto the substrate and an actuator for moving the lens assembly in a plane parallel to the mask and the substrate for suppressing interference effects.
    Type: Grant
    Filed: October 23, 1997
    Date of Patent: January 18, 2000
    Assignee: Hugle Lithography
    Inventors: Elmar Cullman, Reinhard Volkel, Karin M. Wells