Patents Assigned to HUNGARO LUX LIGHT KFT.
  • Patent number: 11029514
    Abstract: This disclosure relates to an antireflection film, as well as its use on a substrate (3) to decrease a fracture of light striking the substrate (3) reflected by said substrate (3), wherein said coating is formed of a transparent first layer (1) applied on the substrate (3) and a transparent second layer (2) on said first layer (1). The essence of the solutions according to this disclosure is that thickness (d1) of the first layer (1) ranges from 10 to 70 nm and refractive index (n1) of said first layer (1) satisfies the relation 1.05<n1<1.35 within the wavelength range of 375 to 1000 nm, and wherein thickness (d2) of the second layer (2) ranges from 30 to 100 nm and refractive index (n2) of said second layer (2) satisfies the relation 1.25<n2<1.5 within the wavelength range of 375 to 1000 nm, and wherein n1<n2 also holds.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: June 8, 2021
    Assignee: HUNGARO LUX LIGHT KFT.
    Inventors: Zoltán Hórvölgyi, Emöke Albert, Lenke Kócs, Csaba Ferenc Major, Jánosné Kabai