Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]??, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ?=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.

Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]?, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]? where ?=1?1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n]?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.

Abstract: Processes have been developed for the manufacture of polyhedral oligomeric silsesquioxanes (POSS), polysilsesquioxanes, polyhedral oligomeric silicates (POS), and siloxane molecules bearing reactive ring-strained cyclic olefins (e.g. norbornenyl, cyclopentenyl, etc. functionalities). The preferred manufacturing processes employ the silation of siloxides (Si—OA, where A=H, alkaline or alkaline earth metals) with silane reagents that contain at least one reactive ring-strained cyclic olefin functionality [e.g., X3-ySi(CH3)y(CH2)2 where y=1-2 and X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R]. Alternatively, similar products can be prepared through hydrosilation reactions between silanes containing at least one silicon-hydrogen bond (Si—H) with ring-strained cyclic olefin reagents [e.g., 5-vinyl, 2 norbornene CH2?CH, cyclopentadiene]. The two processes can be effectively practiced using polymeric silsesquioxanes [RSiO1.