Abstract: A system and a method for an adaptive plasma-cleaning process for a reaction chamber allow continual monitoring by a residual gas analyzer, while active plasma-cleaning is carried out in the reaction chamber. The system includes a valve system and a pump system that allow the residual gas analyzer to perform continual monitoring at a favorable pressure condition that is independent of the active plasma-cleaning process.
Type:
Grant
Filed:
September 13, 2024
Date of Patent:
August 11, 2026
Assignee:
IBSS Group
Inventors:
Larry Tran, Vince Carlino, George Naugle