Patents Assigned to ICFO
  • Patent number: 11891687
    Abstract: A method is provided for manufacturing an article comprising a transparent conductive material, wherein a transparent conductive material (e.g., indium tin oxide) is deposited onto a substrate (e.g., fused silica) by physical vapor deposition, then annealed at high temperature (i.e., at least 450° C.) in a nitrogen atmosphere. The resulting article comprises a transparent conductive material that reduces the trade-off between low resistivity (or sheet resistance) and high near infrared transmission. For example, the transparent conductive material thus obtained may possess a transmission of at least 80% at 1550 nm while having a resistivity of less than or equal to about 5×10?4 Ohm-cm and a Haacke figure of merit of at least about 40×10?4??1. Also provided is a method for modulating the resistivity and/or the near infrared transmission of a transparent conductive material by annealing the transparent conductive material at a high temperature under nitrogen atmosphere.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: February 6, 2024
    Assignees: CORNING INCORPORATED, ICREA, ICFO
    Inventors: Rinu Maniyara, Prantik Mazumder, Valerio Pruneri
  • Patent number: 11807571
    Abstract: Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.
    Type: Grant
    Filed: December 8, 2021
    Date of Patent: November 7, 2023
    Assignees: Corning Incorporated, ICFO
    Inventors: Albert Carrilero, Prantik Mazumder, Valerio Pruneri
  • Patent number: 11548811
    Abstract: Disclosed herein are graphene coatings characterized by a porous, three-dimensional, spherical structure having a hollow core, along with methods for forming such graphene coatings on glasses, glass-ceramics, ceramics, and crystalline materials. Such coatings can be further coated with organic or inorganic layers and are useful in chemical and electronic applications.
    Type: Grant
    Filed: June 28, 2021
    Date of Patent: January 10, 2023
    Assignees: Corning Incorporated, ICFO—THE INSTITUTE OF PHOTONIC SCIENCES, INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS (ICREA)
    Inventors: Connie Li, Xinyuan Liu, Miriam Marchena Martín-Francés, Valerio Pruneri, Wageesha Senaratne, Zhen Song, Kamal Kishore Soni
  • Patent number: 11225434
    Abstract: Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.
    Type: Grant
    Filed: June 3, 2020
    Date of Patent: January 18, 2022
    Assignees: CORNING INCORPORATED, ICFO
    Inventors: Albert Carrilero, Prantik Mazumder, Valerio Pruneri
  • Patent number: 11214491
    Abstract: A method of forming a functionalized device substrate is provided that includes the steps of: forming a graphene layer on a growth substrate; applying a polyimide layer to a glass, glass-ceramic or ceramic substrate, wherein a coupling agent couples the polyimide layer to the said substrate; coupling the polyimide layer to the graphene layer on the growth substrate; and peeling the growth substrate from the graphene layer.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: January 4, 2022
    Assignees: Corning Incorporated, ICFO—THE INSTITUTE OF PHOTONIC SCIENCES, INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS (ICREA)
    Inventors: Therese Francoise Arliguie, Theresa Chang, Miriam Marchena Martín-Francés, Prantik Mazumder, Valerio Pruneri, Frederic Christian Wagner
  • Patent number: 11059741
    Abstract: Disclosed herein are graphene coatings characterized by a porous, three-dimensional, spherical structure having a hollow core, along with methods for forming such graphene coatings on glasses, glass-ceramics, ceramics, and crystalline materials. Such coatings can be further coated with organic or inorganic layers and are useful in chemical and electronic applications.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: July 13, 2021
    Assignees: Corning Incorporated, ICFO—THE INSTITUTE OF PHOTONIC SCIENCES, INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS (ICREA)
    Inventors: Connie Li, Xinyuan Liu, Miriam Marchena Martin-Frances, Valerio Pruneri, Wageesha Senaratne, Zhen Song, Kamal Kishore Soni
  • Patent number: 9828285
    Abstract: Described herein are methods for improved transfer of graphene from formation substrates to target substrates. In particular, the methods described herein are useful in the transfer of high-quality chemical vapor deposition-grown monolayers of graphene from metal, e.g., copper, formation substrates to ultrathin, flexible glass targets. The improved processes provide graphene materials with less defects in the structure.
    Type: Grant
    Filed: December 16, 2015
    Date of Patent: November 28, 2017
    Assignees: Corning Incorporated, ICFO—THE INSTITUTE OF PHOTONIC SCIENCES, INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS (ICREA)
    Inventors: Benedict Yorke Johnson, Xinyuan Liu, Prantik Mazumder, Kamal Kishore Soni, Tonglai Chen, Miriam Marchena, Valerio Pruneri
  • Patent number: 8498043
    Abstract: An optical parametric oscillator including a nonlinear crystal pumped by a laser source and an optical resonator, including an optical interferometer, which determines a level of output coupling of the oscillator, allowing high stability, broad wavelength tuning, and output power level optimization.
    Type: Grant
    Filed: February 11, 2011
    Date of Patent: July 30, 2013
    Assignee: Fundacion “Instituto de Ciencias Fotonicas” (ICFO)
    Inventors: Adolfo Esteban-Martin, Majid Ebrahim-Zadeh