Patents Assigned to Idemitsu Kosam Co., Ltd.
  • Sputtering target, oxide semiconductor thin film, and method for producing these
    Patent number: 11443943
    Abstract: A sputtering target including an oxide that includes an indium (In) element, a tin (Sn) element, a zinc (Zn) element and an aluminum (Al) element, wherein the oxide includes a homologous structure compound represented by InAlO3(ZnO)m (m is 0.1 to 10) and a bixbyite structure compound represented by In2O3.
    Type: Grant
    Filed: December 5, 2018
    Date of Patent: September 13, 2022
    Assignee: Idemitsu Kosam Co., Ltd.
    Inventors: Kazuaki Ebata, Nozomi Tajima