Patents Assigned to IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
  • Patent number: 11947259
    Abstract: Provided is a photoinitiator composition containing an acylcarbazole derivative and a carbazolyl oxime ester. The photoinitiator composition is used in a photocurable composition, especially a photoresist formulation, and exhibits the best sensibilization effect when the molar ratio of the acylcarbazole derivative to the carbazolyl oxime ester photoinitiator is between 0.1 and 1.4.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: April 2, 2024
    Assignee: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
    Inventors: Wenchao Zhao, Chenlong Wang, Jiaqi Li, Yonglin Wang
  • Publication number: 20220185775
    Abstract: Provided in the present invention is a novel diaroyl carbazole compound, used together with a carbazolyl oxime ester photo initiator to show a significant synergistic initiation effect in a photoresist composition; the best sensitising effect is shown when the molar ratio of the diaroyl carbazole compound and the carbazolyl oxime ester photoinitiator is 0.1-1.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 16, 2022
    Applicant: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Wenchao Zhao, Jiaqi Li, Zhongli Ma, Chenlong Wang, Yonglin Wang
  • Publication number: 20220179309
    Abstract: Provided is a photoinitiator composition containing an acylcarbazole derivative and a carbazolyl oxime ester. The photoinitiator composition is used in a photocurable composition, especially a photoresist formulation, and exhibits the best sensibilization effect when the molar ratio of the acylcarbazole derivative to the carbazolyl oxime ester photoinitiator is between 0.1 and 1.4.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 9, 2022
    Applicant: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD
    Inventors: Wenchao Zhao, Chenlong Wang, Jiaqi Li, Yonglin Wang