Patents Assigned to Ikonics Corporation
  • Patent number: 10752036
    Abstract: The present application is directed to a transferable film for dye sublimation, the film comprising, in an example implementation, a carrier film; and a dye sublimation-receptive layer comprising a base resin that undergoes crosslinking at elevated temperatures. In an example implementation, the dye sublimation-receptive layer comprises an acrylic copolymer with acrylate reactive groups. Methods of using the transferrable film to create a dye sublimation-receptive surface are also provided, as are substrates having a substantially non-receptive to dye sublimation inks onto which is formed a thermally crosslinked layer to the substrate surface.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: August 25, 2020
    Assignee: Ikonics Corporation
    Inventor: Troy Bergstedt
  • Patent number: 9381766
    Abstract: Embodiments of the invention include ink receptive media for use in prototyping and transfer of a UV curable acid resist ink to surfaces for etching. Further embodiments are directed to an ink receptive media used for prototyping and transfer of a UV curable acid resist ink to surfaces for etching. In some implementations the films of the invention are useful for transfer of acid resist inks, maximizing ink droplet contact angle, and ink receptive surface for prototyping inks.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: July 5, 2016
    Assignee: Ikonics Corporation
    Inventor: Daniel J. Kamben
  • Patent number: 9044986
    Abstract: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: June 2, 2015
    Assignee: IKONICS CORPORATION
    Inventors: Toshifumi Komatsu, Jeremy W. Peterson, Alexander S. Gybin
  • Publication number: 20140255624
    Abstract: Embodiments of the invention include ink receptive media for use in prototyping and transfer of a UV curable acid resist ink to surfaces for etching. Further embodiments are directed to an ink receptive media used for prototyping and transfer of a UV curable acid resist ink to surfaces for etching. In some implementations the films of the invention are useful for transfer of acid resist inks, maximizing ink droplet contact angle, and ink receptive surface for prototyping inks.
    Type: Application
    Filed: March 6, 2014
    Publication date: September 11, 2014
    Applicant: IKONICS CORPORATION
    Inventor: Daniel J. Kamben
  • Patent number: 8361330
    Abstract: A laminate for making signs, the laminate comprising a readily-abraded layer and an abrasion-resistant layer. A method of making signs is also disclosed. The method includes providing a laminate comprising a first layer that is readily etched by abrasives and a second layer disposed beneath the first layer and substantially resistant to abrasive etching. A mask is applied to the top of the laminate; and abrasives are used to selectively remove a portion of the first layer, so as to form a relief image with a controlled and uniform relief depth.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: January 29, 2013
    Assignee: Ikonics Corporation
    Inventor: Toshifumi Komatsu
  • Publication number: 20120237700
    Abstract: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.
    Type: Application
    Filed: December 16, 2011
    Publication date: September 20, 2012
    Applicant: IKONICS CORPORATION
    Inventors: Toshifumi Komatsu, Jeremy W. Peterson, Alexander S. Gybin
  • Patent number: 8097176
    Abstract: Methods, materials, and systems for texturizing mold surfaces is disclosed. In one method and system of the invention, a first step involves generating a graphics file of a desired texture pattern. The graphics file is subsequently output to an ink jet printer, which is configured to print using an acid-etch resist ink. The acid-etch resist ink is formulated to provide optimal properties for ink-jet printing, while also providing excellent acid-etch resist and superior handling properties. The acid-etch resist ink is printed onto a sheet of a carrier substrate that allows the acid-etch resist to be transferred to a mold surface, after which the mold surface is etched with a strong acid.
    Type: Grant
    Filed: January 19, 2007
    Date of Patent: January 17, 2012
    Assignee: Ikonics Corporation
    Inventors: Toshifumi Komatsu, Jeremy W. Peterson, Alexander S. Gybin
  • Patent number: 7964335
    Abstract: The present invention is directed to an ink receptive film and methods of using the ink receptive film. The ink receptive film is generally suitable for etching patterns into substrates, and typically includes a photosensitive laminate structure containing at least an ink receptive, radiation transmissive layer; and at least one photosensitive resist layer.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: June 21, 2011
    Assignee: Ikonics Corporation
    Inventors: Toshifumi Komatsu, Kyle Johnson, William Charles Ulland