Patents Assigned to Image Quest Technologies, Inc.
  • Patent number: 5954559
    Abstract: An improved planar color filter structure to reduce defects in the display devices incorporating the color filter structures, including active matrix displays. A color filter substrate has a thicker polyamide black matrix formed thereon and a transparent polyamide layer formed over the black matrix. The transparent layer is exposed through the black matrix and developed to remove the unexposed portions over the black matrix. The resulting surface is substantially planar and facilitates the forming of the remaining layers to form a substantially planar color filter structure.
    Type: Grant
    Filed: January 13, 1997
    Date of Patent: September 21, 1999
    Assignee: Image Quest Technologies, Inc.
    Inventors: Scott H. Holmberg, Shan Zhu
  • Patent number: 5737041
    Abstract: Improved thin film transistors to reduce defects in the devices incorporating the transistors, including active matrix displays. A first improvement is accomplished by forming a dual insulator layer over the bottom metal layer, which can be the gate line and also the row line in an active matrix display. The first insulator layer is formed by anodizing the metal layer and the second insulator layer is deposited onto the first layer. The dual insulator structure layer can be reanodized to eliminate the effect of pinholes. A second improvement includes providing an interdigitated transistor structure to increase the channel width, minimize internal shorting and minimize the drain capacitance. The interdigitated structure includes at least one source or drain finger formed between at least two drain or source fingers, respectively. A shorted source finger can be disconnected to maintain an operative transistor.
    Type: Grant
    Filed: July 31, 1995
    Date of Patent: April 7, 1998
    Assignee: Image Quest Technologies, Inc.
    Inventors: Scott H. Holmberg, Ronald L. Huff
  • Patent number: 5731216
    Abstract: Improved multilayer matrix line including inverted gate thin film matrix transistors to reduce defects in and enhance performance of matrix devices incorporating the transistors, including active matrix displays. The inverted gate line is formed in a multilayer metal structure deposited sequentially before patterning of a first bottom refractory layer, an aluminum layer and a second refractory layer for the gate structure. The aluminum layer is anodized adjacent the gate to prevent step coverage problems. A further improvement is provided when forming an active matrix display storage capacitor utilizing the multilayer gate structure.
    Type: Grant
    Filed: March 27, 1996
    Date of Patent: March 24, 1998
    Assignee: Image Quest Technologies, Inc.
    Inventors: Scott H. Holmberg, Rajesh Swaminathan