Patents Assigned to IMS Ionen Mikrofabrikations Systeme Gesellschaft GmbH
  • Particle or radiation beam mask and process for making same
    Patent number: 4891547
    Abstract: The mask of our invention can be used in image forming units, for example in ion projection microlithography. The mask comprises a mask foil clamped into a retaining frame. The mask foil has a larger thermal expansion coefficient than the retaining frame. To make this mask the mask foil and retaining frame are heatead to a higher temperature than room temperature and clamped in position at this temperature.
    Type: Grant
    Filed: June 10, 1988
    Date of Patent: January 2, 1990
    Assignee: IMS Ionen Mikrofabrikations Systeme Gesellschaft GmbH
    Inventors: Gerhard Stengl, Hans Loschner