Abstract: A method for determining parameters of an imaging transfer function (point spread function) is presented. With regard to a model that describes the imaging transfer function including a number of model parameters, a test substrate is exposed and developed using a test pattern which comprises multiple sub-patterns that are based on the same sub-pattern template but with varying control width of a feature in the template, such as the width of a line or a distance between lines. On the test substrate, isofocal dose measurements are performed using the structures thus formed on a test substrate with varying control and imaging parameters. The isofocal dose thus determined are utilized to determine the model parameters of the imaging transfer function.

Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is irradiated with a beam of electrically charged particles through a plurality of apertures to form corresponding beamlets, comprises an aperture array device in which said apertures are realized according to several sets of apertures arranged in respective aperture arrangements, and an absorber array device having openings configured for the passage of at least a subset of beamlets that are formed by the apertures. The absorber array device comprises openings corresponding to one of the aperture arrangement sets, whereas it includes a charged-particle absorbing structure comprising absorbing regions surrounded by elevated regions and configured to absorb charged particles impinging thereupon at locations corresponding to apertures of the other aperture arrangements of the aperture array device, effectively confining the effects of irradiated particles and electric charge therein.

Abstract: A beam calibration device is presented for calibrating a charged-particle beam in a charged-particle processing apparatus in relation to a positioning of the beam with respect to a target. The beam calibration device includes a detector for the charged particles that are arriving at a registering structure of said device. The beam is deflected from a designated target position towards the device, by means of a lateral initial deflection, thus allowing the beam to impinge on at least one of the registering structures. The beam is scanned over the beam calibration device, thus covering a pre-defined region on this device including the registering structure, and using the detector, an electric current is measured as a current signal and is evaluated, to determine a central relative position of the beam with respect to an optimal position predefined on the beam calibration device surface.

Abstract: The invention proposes adjusting the optical imaging system of a charged-particle multi-beam processing apparatus with regard to spatial and angular image distortion of the beam field, which describes the deviation of landing positions and landing angles of beamlets from respective nominal values within the beam field. Starting from a determination of the image distortion, so-called fingerprints are determined, which represent the change of image distortion effected by a unit change of a respective operating parameter of a component of the projection optics; then values of operating parameters are obtained which optimize a corrected distortion obtained from a superposition of the image distortion and a change of operating parameters that causes a variation of the image distortion, as expressed by a linear combination of said fingerprints. The optimizing values thus obtained are applied to the respective optical elements of the projection optics.

Abstract: A method for determining focal properties in a target beam field of a charged-particle multi-beam processing apparatus is presented, where the focal properties relate to aperture images formed by the beamlets at or near the target within this apparatus, such as height of focus, astigmatic length, or size of blur. By modifying an electrostatic voltage of a lens or another suitable operating parameter of the projection optics, the landing angles of the beamlets are tilted by a small tilting angle, causing a small displacement of the positions where the beamlets hit the target surface. Using the amounts of displacement and the change of landing angles a map is generated that describes a mapping from the change of landing angles to the amounts of displacement as a function of the position, for instance by using a best fit to a predefined model; this map is then used to extract the focal properties, which in turn can be used to correct for imaging errors in the processing apparatus.

Abstract: In a writing process in a charged-particle multi-beam apparatus, a desired pattern is written onto a target wherein said desired pattern is provided as input pattern data (INPDAT) in a vector format and processed through a pattern data processing flow. A data preprocessing system receives the input pattern data (INPDAT) and preprocesses the input pattern data independently of the writing process, preferably in advance to it, using writing parameter data provided to the data preprocessing system, and writes the intermediate pattern data (IMDAT) thus obtained to a data storage. When a writing process is carried out using the apparatus, its writing control system reads the intermediate pattern data from the data storage, converts them into pattern streaming data (SBUF), and streams the pattern streaming data to the apparatus for writing the pattern to the target.

Abstract: A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets and a yoke body, surrounding a beam passage extending along the longitudinal axis. The permanent magnet is arranged between an inner yoke component and an outer yoke component so as to form a magnetic circuit having at least two gaps, generating a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. An electromagnetic adjustment coil is located between the inner and outer yoke shell. This electromagnetic adjustment coil is driven by an adjustable supply current running primarily along a circumferential direction and modifies the magnetic flux in the magnetic circuit to cause a variation in the magnetic flux density in the gaps.

Abstract: A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets and a yoke body, surrounding a beam passage extending along the longitudinal axis. The permanent magnet is arranged between an inner yoke component and an outer yoke component so as to form a magnetic circuit having at least two gaps, generating a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. In order to modify the magnetic flux and thus the magnetic field in the gaps, a thermal control element located in the yoke body introduces or extracts heat to or from components of the of the magnetic circuit assembly so as to thermally control or modulate the magnetic behavior of said components.

Abstract: A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets, a yoke body, and a shunting device comprising a shunting component, and this assembly surrounds a beam passage extending along the longitudinal axis (cx). The shunting device is placed in the yoke body besides the permanent magnets and may be composed of several sector components, comprising different high magnetically permeable materials. The permanent magnet and the yoke body form a magnetic circuit having at least two gaps, in order to generate a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. The shunting device partially bypasses the magnetic flux of said circuit assembly and thus reduces the magnetic field to a desired value.

Abstract: The invention relates to a multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, said device being adapted to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming a corresponding number of beamlets, said device comprising an aperture array device in which at least two sets of apertures are realized, an opening array device located downstream of the aperture array device having a plurality of openings configured for the passage of beamlets, said opening array device comprises impact regions, wherein charged impinge upon said impact regions.

Abstract: A pattern writing method for charged-particle lithography apparatuses using an improved correction for thermal distortion of the substrate includes determining an exposure position where the beam impinges on the substrate and the power of the beam at the exposure position; calculating heating of the substrate at the exposure position, and calculating, for a plurality of locations over the substrate, and the thermal diffusion and radiative cooling; calculating, for the same or a reduced plurality of locations on the substrate, the positional change of the substrate due to thermal expansion; determining a displacement distance which compensates the positional change at the exposure position, updating the structure to be written by shifting the exposure position of the beam by said displacement distance, and writing the updated structures on the substrate with the beam. These steps are repeated as a function of time and/or varying exposure position of the beam substrate position.

Abstract: A charged-particle source for generating a charged-particle comprises a sequence of electrodes, including an emitter electrode with an emitter surface, a counter electrode held at an electrostatic voltage with respect to the emitter electrode at a sign opposite to that of the electrically charged particles, and one or more adjustment electrodes surrounding the source space between the emitter electrode and the counter electrode. These electrodes have a basic overall rotational symmetry along a central axis, with the exception of one or more steering electrodes which is an electrode which interrupts the radial axial-symmetry of the electric potential of the source, for instance tilted or shifted to an eccentric position or orientation, configured to force unintended, secondary charged particles away from the emission surface.

Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is irradiated with a beam of electrically charged particles and allows passage of the beam through a plurality of apertures to form corresponding beamlets, comprises an aperture array device in which said apertures are realized according to several sets of apertures arranged in respective aperture arrangements, and an absorber array device having a plurality of openings configured for the passage of at least a subset of beamlets that are formed by the apertures.

Abstract: A method for irradiating a target with a beam of energetic electrically charged particles, wherein the target comprises an exposure region where an exposure by said beam is to be performed, and the exposure of a desired pattern is done employing a multitude of exposure positions on the target. Each exposure position represents the location of one of a multitude of exposure spots of uniform size and shape, with each exposure spot covering at least one pattern pixel of the desired pattern. The exposure positions are located within a number of mutually separate cluster areas which are defined at respective fixed locations on the target. In each cluster area the exposure position are within a given neighboring distance to a next neighboring exposure position, while the cluster areas are separated from each other by spaces free of exposure positions, which space has a width, which is at least the double of the neighboring distance.

Abstract: A fine-adjustable electromagnetic lens for a charged-particle optical apparatus comprises a magnetic circuit assembly including one or more ring magnets, and a sleeve insert of generally rotational symmetry around a longitudinal axis. The sleeve insert surrounds a passage opening extending along the longitudinal axis, and comprises several electrically conductive electrode elements configured to generate an electrostatic field within the passage opening. The ring magnets are arranged circumferentially around an inner yoke shell and surrounded by an outer yoke shell; the inner yoke shell in turn surrounds a central portion of the sleeve insert. The ring magnets are magnetized such that the two magnetic poles are oriented towards the inner and outer yoke shell, respectively.

Abstract: In a writing process in a charged-particle multi-beam apparatus, a desired pattern is written onto a target wherein said desired pattern is provided as input pattern data (INPDAT) in a vector format and processed through a pattern data processing flow. A data preprocessing system receives the input pattern data (INPDAT) and preprocesses the input pattern data independently of the writing process, preferably in advance to it, using writing parameter data provided to the data preprocessing system, and writes the intermediate pattern data (IMDAT) thus obtained to a data storage. When a writing process is carried out using the apparatus, its writing control system reads the intermediate pattern data from the data storage, converts them into pattern streaming data (SBUF), and streams the pattern streaming data to the apparatus for writing the pattern to the target.

Abstract: A charged-particle source for generating a charged-particle comprises a sequence of electrodes, including an emitter electrode with an emitter surface, a counter electrode held at an electrostatic voltage with respect to the emitter electrode at a sign opposite to that of the electrically charged particles, and one or more adjustment electrodes surrounding the source space between the emitter electrode and the counter electrode. These electrodes have a basic overall rotational symmetry along a central axis, with the exception of one or more steering electrodes which is an electrode which interrupts the radial axial-symmetry of the electric potential of the source, for instance tilted or shifted to an eccentric position or orientation, configured to force unintended, secondary charged particles away from the emission surface.

Abstract: In a charged-particle lithography apparatus, during writing a desired pattern, the duration of exposure slots is adapted to compensate for fluctuations of the particle beam. In the writing process the aperture images are mutually overlapping on the target so each pixel is exposed through a number of aperture images overlapping at the respective pixel, which results in an exposure of the respective pixel through an effective pixel exposure time, i.e.

Abstract: In order to compensate for undesired effects of varying elevation of a target with respect to a nominal target plane, during writing a desired pattern on the target in a charged-particle beam apparatus, the pattern is re-calculated in each of a number of segments of the target plane by: determining an elevation of the target in the segment from the nominal target plane; determining a local blur value which represents the actual value of blur corresponding to the elevation, with regard to a dependence of the blur upon the elevation of the target; calculating a convolution kernel which represents a point spreading function realizing a local blur value; and re-calculating a nominal exposure pattern by applying the kernel to the pattern. The convolution kernel corresponds to introducing an additional blur into the pattern in the segment, increasing the blur to a given target blur value which is uniform to all segments.

Abstract: A charged-particle source for emission of electrons or other electrically charged particles comprises, located between the emitter electrode having an emitter surface and a counter electrode, at least two adjustment electrodes; a pressure regulator device is configured to control the gas pressure in the source space at a pre-defined pressure value. In a first cleaning mode of the particle source, applying a voltage between the emitter and counter electrodes directs gas particles towards the counter electrode, generating secondary electrons which ionize particles of the gas in the source space, and electrostatic potentials are applied to at least some of the adjustment electrodes, generating an electric field directing the ionized gas particles onto the emitter surface.