Abstract: Composite material (10) comprises a substrate (1) and a chemically, mechanically, physically, catalytically and/or optically functional titanium oxide layer (2), applied on at least one side thereof. A titanium oxide layer (2) is deposited on the substrate (1) as a base layer (3), made from TiOx with an oxygen content of 0.7?x<2, or made from TiOx(OH)y with an oxygen content of 0.5?x<2 and a hydroxide content of 0?y<0.7 and an upper layer (4) of amorphous and/or crystalline TiO2 applied to said base layer (3). In a first method variation, firstly a base layer (3) of TiOx with an oxygen content of 0.7?×<2 is reactively or non-reactively deposited, then, through an increase in the oxygen content, the process pressure, the capacity and/or the substrate temperature, an upper layer (4) of amorphous and/or crystalline TiO2 is deposited. In a second method variation, firstly a base layer (3) of TiOx with an oxygen content of 0.

Abstract: A composite comprises a chemical, mechanical and/or optical protective and/or diffusion barrier layer disposed on a metal or plastic substrate. The layer consists of an organic layer matrix with metal-containing particles dispersed therein, the metal-containing organic layer being plasma-polymerized starting from at least one hydrocarbon which can be substituted and one metal-containing component. The protective and/or diffusion barrier layer is used in a thickness (d) in the submicron range and contains metal particles finely dispersed therein, that have a grain size that lies below 50% of the layer thickness (d). The organic layer matrix is deposited by plasma polymerization from a process gas that comprises at least one hydrocarbon that can also be substituted and one metal-containing component and/or an inorganic gas in a reactor that can be evacuated.

Abstract: Composite material (10) comprises a substrate (1) and a chemically, mechanically, physically, catalytically and/or optically functional titanium oxide layer (2), applied on at least one side thereof. A titanium oxide layer (2) is deposited on the substrate (1) as a base layer (3), made from TiOx with an oxygen content of 0.7?x<2, or made from TiOx(OH)y with an oxygen content of 0.5?x<2 and a hydroxide content of 0?y<0.7 and an upper layer (4) of amorphous and/or crystalline TiO2 applied to said base layer (3). In a first method variation, firstly a base layer (3) of TiOx with an oxygen content of 0.7?x<2 is reactively or non-reactively deposited, then, through an increase in the oxygen content, the process pressure, the capacity and/or the substrate temperature, an upper layer (4) of amorphous and/or crystalline TiO2 is deposited. In a second method variation, firstly a base layer (3) of TiOx with an oxygen content of 0.