Patents Assigned to INDIAN INSTITUTE OF TECHNOLOGY ROPAR
  • Publication number: 20240098936
    Abstract: The present invention discloses microtextures for a thin-film evaporation. The microstructure is called as wedged micropillar and a forest of these micropillar helps in maintaining a thin-film of liquid over the heat sink surface through capillary action. The inherent sharp corners of these wedged micropillars drives the liquid filament along the vertical direction and the large mean curvature of the liquid meniscus provides high capillary pumping pressure. At the same time, these microstructures can offer high permeability for liquid flow thereby leading to low viscous pressure loss as compared to the cylindrical microstructured heat sink. As a result of these, the predicted dryout heat flux for thin-film evaporation is more than twice that of the conventional cylindrical microstructures. Also, we have proposed a combined architecture of wedged and cylindrical micropillars for hotspot-targeted cooling application.
    Type: Application
    Filed: August 3, 2023
    Publication date: March 21, 2024
    Applicant: INDIAN INSTITUTE OF TECHNOLOGY ROPAR
    Inventors: Chander Shekhar SHARMA, Anand S
  • Patent number: 11039089
    Abstract: The present subject matter proposes a novel pulse compression favourable non-periodic thermal wave imaging that enhance the energy concentration capabilities and defect detection sensitivity and resolution in comparison with presently used pulse compression favourable thermal wave imaging approaches. This is due to most of the supplied energy is concentrated in the main lobe and very less energy will be redistributed to side lobes by the proposed Complimentary Golay coded excited thermal wave imaging.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: June 15, 2021
    Assignee: INDIAN INSTITUTE OF TECHNOLOGY ROPAR
    Inventors: Ravibabu Mulaveesala, Vanita Arora, Geetika Dua
  • Patent number: 10835920
    Abstract: Disclosed is a technology being implemented in an apparatus for coating a substrate with swarf particles. The apparatus facilitates depositing metal coating onto metal surfaces, polymers, and ceramics. In this apparatus, the grinding process is retrofitted to deposit coatings onto substrates that range from soft (e.g., polymers and aluminium) to hard (e.g., glass-ceramic) materials. The apparatus comprises a sample holder, an infeed, and a grinding wheel. The sample holder holds a substrate to be coated with swarf particles. The infeed holding a work piece. The grinding wheel is mounted at a predefined height over the infeed. The apparatus is used to perform metal coating by depositing the swarf materials on surface of the substrate. It may be noted that the swarf materials are generated by grinding the work piece with the grinding wheel.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: November 17, 2020
    Assignees: INDIAN INSTITUTE OF TECHNOLOGY ROPAR, SWINBURNE UNIVERSITY OF TECHNOLOGY
    Inventors: Malkeet Singh, Harpreet Singh, Christopher Charles Berndt