Abstract: Provided are a method of forming an oxide thin film and an electrical device and thin film transistor using the method. The method includes forming an oxide thin film on a substrate by applying a precursor solution; and performing a thermal treatment process on the substrate under a pressurized atmosphere using a gas at about 100° C. to about 400° C.
Type:
Grant
Filed:
November 22, 2011
Date of Patent:
June 7, 2016
Assignee:
Indystry-Academic Cooperation Foundation, Yonsei University
Inventors:
Hyun Jae Kim, Hyun Soo Shin, You Seung Rim