Patents Assigned to Infineon Technologes AG
  • Publication number: 20130200786
    Abstract: A plasma cell and a method for making a plasma cell are disclosed. In accordance with an embodiment of the present invention, a cell comprises a semiconductor material, an opening disposed in the semiconductor material, a dielectric layer lining a surface of the opening, a cap layer closing the opening, a first electrode disposed adjacent the opening, and a second electrode disposed adjacent the opening.
    Type: Application
    Filed: February 3, 2012
    Publication date: August 8, 2013
    Applicant: Infineon Technologes AG
    Inventor: Dirk Meinhold